| Microstructure, wettability, optical and electrical properties of HfO2 thin films: Effect of oxygen partial pressure | |
| Jin,P.; Xiao,D. Q.; Zheng,C. Y.; Sun,Z. Q.; Liu,M.; Gao,J.; Deng,B.; He,G. | |
| 刊名 | Journal of Alloys and Compounds
 |
| 2016 | |
| 卷号 | Vol.662页码:339-347 |
| 关键词 | CHEMICAL-VAPOR-DEPOSITION SPUTTERED HAFNIUM OXIDE GATE DIELECTRICS RATIO MODULATION COATINGS LAYER |
| ISSN号 | 0925-8388 |
| URL标识 | 查看原文 |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/2159642 |
| 专题 | 安徽大学 |
| 作者单位 | 1.Anhui Univ, Radiat Detect Mat & Devices Lab, Sch Phys & Mat Sci, Hefei 230601, Peoples R China 2.Chinese Acad Sci, Inst Solid State Phys, Anhui Key Lab Nanomat & Nanostruct, Key Lab Mat Phys, Hefei 230031, Peoples R China |
| 推荐引用方式 GB/T 7714 | Jin,P.,Xiao,D. Q.,Zheng,C. Y.,et al. Microstructure, wettability, optical and electrical properties of HfO2 thin films: Effect of oxygen partial pressure[J]. Journal of Alloys and Compounds,2016,Vol.662:339-347. |
| APA | Jin,P..,Xiao,D. Q..,Zheng,C. Y..,Sun,Z. Q..,Liu,M..,...&He,G..(2016).Microstructure, wettability, optical and electrical properties of HfO2 thin films: Effect of oxygen partial pressure.Journal of Alloys and Compounds,Vol.662,339-347. |
| MLA | Jin,P.,et al."Microstructure, wettability, optical and electrical properties of HfO2 thin films: Effect of oxygen partial pressure".Journal of Alloys and Compounds Vol.662(2016):339-347. |
| 个性服务 |
| 查看访问统计 |
| 相关权益政策 |
| 暂无数据 |
| 收藏/分享 |
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。
修改评论