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Anisotropic laser-induced damage threshold and residual stress of TiO 2 sculptured thin films (CPCI-S收录EI收录)
Xiao, Xiudi[1,2]; Miao, Lei[1]; Zhang, Ming[1]; Xu, Gang[1]; Shao, Jianda[2]; Fan, Zhengxiu[2]
会议名称Journal of Nanoscience and Nanotechnology
关键词Anisotropy Deposition Electron beams Laser damage Mechanical properties Optical microscopy Optical properties Raman scattering Residual stresses Thin films Titanium dioxide Ultraviolet spectroscopy
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内容类型会议论文
URI标识http://www.corc.org.cn/handle/1471x/2051316
专题华南理工大学
作者单位1.[1] Key Laboratory for Renewable Energy and Gas Hydrates, Guangzhou Institute of Energy Conversion, Chinese Academy of Sciences, Guangzhou, 510640, China
2.[2] Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Science, Shanghai, 201800, China
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GB/T 7714
Xiao, Xiudi[1,2],Miao, Lei[1],Zhang, Ming[1],等. Anisotropic laser-induced damage threshold and residual stress of TiO 2 sculptured thin films (CPCI-S收录EI收录)[C]. 见:Journal of Nanoscience and Nanotechnology.
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