Refractive index and thickness analysis of natural silicon dioxide film growing on silicon with variable-angle spectroscopic ellipsometry

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	Refractive index and thickness analysis of natural silicon dioxide film growing on silicon with variable-angle spectroscopic ellipsometry
	Chen YY(陈艳艳); Jin G(靳刚)
刊名	Spectroscopy
	2006
通讯作者邮箱	gajin@imech.ac.cn
卷号	21 期号:10 页码:26-31
ISSN号	0887-6703
通讯作者	Chen, YY (reprint author), Chinese Acad Sci, Inst Mech, Beijing 100080, Peoples R China.
中文摘要	The refractive index and thickness of SiO2 thin films naturally grown on Si substrates were determined simultaneously within the wavelength range of 220-1100 nm with variable-angle spectroscopic ellipsometry. Different angles of incidence and wavelength ranges were chosen to enhance the analysis sensitivity for more accurate results. Several optical models describing the practical SiO2-Si system were investigated, and best results were obtained with the optical model, including an interface layer between SiO2 and Si, which proved the existence of the interface layer in this work as described in other publications.
学科主题	力学
类目[WOS]	Spectroscopy
研究领域[WOS]	Spectroscopy
关键词[WOS]	OPTICAL-CONSTANTS ; SI/SIO2 INTERFACE ; ATOMIC-SCALE ; OXIDE ; SI
收录类别	SCI ; EI
原文出处	http://spectroscopyonline.findanalytichem.com/spectroscopy/article/articleDetail.jsp?id=381979
语种	英语
WOS记录号	WOS:000241234300003
公开日期	2007-06-15
内容类型	期刊论文
源URL	[http://dspace.imech.ac.cn/handle/311007/17228]
专题	力学研究所_力学所知识产出(1956-2008)
推荐引用方式 GB/T 7714	Chen YY,Jin G. Refractive index and thickness analysis of natural silicon dioxide film growing on silicon with variable-angle spectroscopic ellipsometry[J]. Spectroscopy,2006,21(10):26-31.
APA	陈艳艳,&靳刚.(2006).Refractive index and thickness analysis of natural silicon dioxide film growing on silicon with variable-angle spectroscopic ellipsometry.Spectroscopy,21(10),26-31.
MLA	陈艳艳,et al."Refractive index and thickness analysis of natural silicon dioxide film growing on silicon with variable-angle spectroscopic ellipsometry".Spectroscopy 21.10(2006):26-31.