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	Non-Uniformity of Ion Implantation in Direct-Current Plasma Immersion Ion Implantation
	Liu Cheng-Sen; Wang De-Zhen; Fan Yu-Jia; Zhang Nan; Guan Li and Yao Yuan
刊名	Chinese Physics Letters
	2010
卷号	Vol.27 No.7页码:075201
关键词	SURFACE MODIFICATION MODEL
ISSN号	0256-307X;1741-3540
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/1855167
专题	辽宁师范大学
作者单位	1.College of Physics and Electronic Technology, Liaoning Normal University, Dalian 2.State Key Laboratory for Materials Modification by Laser, Ion and Electron Beams, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 3.lchs@vip.sina.com
推荐引用方式 GB/T 7714	Liu Cheng-Sen,Wang De-Zhen,Fan Yu-Jia,et al. Non-Uniformity of Ion Implantation in Direct-Current Plasma Immersion Ion Implantation[J]. Chinese Physics Letters,2010,Vol.27 No.7:075201.
APA	Liu Cheng-Sen,Wang De-Zhen,Fan Yu-Jia,Zhang Nan,&Guan Li and Yao Yuan.(2010).Non-Uniformity of Ion Implantation in Direct-Current Plasma Immersion Ion Implantation.Chinese Physics Letters,Vol.27 No.7,075201.
MLA	Liu Cheng-Sen,et al."Non-Uniformity of Ion Implantation in Direct-Current Plasma Immersion Ion Implantation".Chinese Physics Letters Vol.27 No.7(2010):075201.

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