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Influence of substrates on the properties of titanium nitride films deposited by DC reaction magnetron sputtering
Gu, Peng; Zhu, Xinghua; Li, Jitao; Wu, Haihua; Sun, Hui; Yang, Dingyu
刊名APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
2018
卷号Vol.124 No.8
ISSN号0947-8396
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/1844579
专题四川大学
作者单位1.Chengdu Univ Informat Technol, Coll Optoelect Technol, Chengdu 610225, Sichuan, Peoples R China
2.Sichuan Univ Arts & Sci, Coll Intelligent Mfg, Dazhou 635002, Peoples R China
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GB/T 7714
Gu, Peng,Zhu, Xinghua,Li, Jitao,et al. Influence of substrates on the properties of titanium nitride films deposited by DC reaction magnetron sputtering[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,2018,Vol.124 No.8.
APA Gu, Peng,Zhu, Xinghua,Li, Jitao,Wu, Haihua,Sun, Hui,&Yang, Dingyu.(2018).Influence of substrates on the properties of titanium nitride films deposited by DC reaction magnetron sputtering.APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,Vol.124 No.8.
MLA Gu, Peng,et al."Influence of substrates on the properties of titanium nitride films deposited by DC reaction magnetron sputtering".APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING Vol.124 No.8(2018).
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