Controllable process of nanostructured GaN by maskless inductively coupled plasma (ICP) etching

	Controllable process of nanostructured GaN by maskless inductively coupled plasma (ICP) etching
	Zhao, Yanfei; Hu Wang; Wei Zhang; Li, Jiadong; Yang Shen; Huang, Zengli（黄增立）; Jian Zhang（张鉴）; An Dingsun（丁孙安）; Zhang J(张鉴); Ding SA(丁孙安)
刊名	JOURNAL OF MICROMECHANICS AND MICROENGINEERING
	2017
语种	英语
内容类型	期刊论文
源URL	[http://ir.sinano.ac.cn/handle/332007/5334]
专题	苏州纳米技术与纳米仿生研究所_大科学装置
通讯作者	Zhang J(张鉴); Ding SA(丁孙安)
推荐引用方式 GB/T 7714	Zhao, Yanfei,Hu Wang,Wei Zhang,et al. Controllable process of nanostructured GaN by maskless inductively coupled plasma (ICP) etching[J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING,2017.
APA	Zhao, Yanfei.,Hu Wang.,Wei Zhang.,Li, Jiadong.,Yang Shen.,...&丁孙安.(2017).Controllable process of nanostructured GaN by maskless inductively coupled plasma (ICP) etching.JOURNAL OF MICROMECHANICS AND MICROENGINEERING.
MLA	Zhao, Yanfei,et al."Controllable process of nanostructured GaN by maskless inductively coupled plasma (ICP) etching".JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2017).