| 题名 | 用于光学玻璃超光滑表面抛光的铈基抛光液的研究 |
| 作者 | 梁尚娟 |
| 文献子类 | 硕士 |
| 导师 | 朱健强 |
| 关键词 | 超光滑表面抛光 Ultra-smooth surface polishing 光学元件 Optical elements 纳米氧化铈 Nano-CeO2 抛光性能 Polishing performance 电解质 Electrolyte |
| 其他题名 | Study on cerium-based slurry for ultra-smooth surface polishing of optical glasses |
| 英文摘要 | 光学元件加工的表面质量是限制高功率激光装置负载能力提升的主要因素之一，从而阻碍了惯性约束核聚变的发展。超光滑表面抛光技术是光学元件加工中应用最广泛的表面加工技术。目前发展比较成熟的抛光方法有很多种，其中以化学机械抛光（CMP）的应用最为广泛，它是一种精密的复合加工方法，是目前唯一可以提供全局平整化的抛光技术。影响抛光效果的因素有很多，抛光液作为抛光系统里至关重要的一部分，其性能好坏，将直接决定被抛光元件表面质量的好坏。抛光液的性能包括磨料粒子的粒度分布、悬浮稳定性、分散性、硬度、以及各种添加剂的协同作用能力等，抛光液中的添加剂对抛光液的性能有很大的影响。因此，抛光液的调配工作尤为重要，是化学机械抛光领域研究的热点之一。 本文主要从解决纳米氧化铈颗粒团聚问题入手，采用表面改性的方法来提高抛光液的性能，探讨了改性剂的浓度对抛光效果的影响。研究了电解质的引入对抛光液性能的影响，提出溶剂化膜对抛光的影响作用机理。具体研究内容如下： 一、纳米氧化铈颗粒表面改性。本文采用阴离子表面活性剂——梅迪兰对纳米氧化铈颗粒进行表面改性，通过X射线衍射（XRD）、红外光谱（FTIR）分析、热失重分析（TGA）等材料表征手段证明梅迪兰成功地包覆到了粒子表面，且不改变其晶体结构。 二、改性抛光液对K9光学玻璃抛光性能的影响。从抛光液中粒子的粒度分布、分散性两方面评价了梅迪兰浓度对抛光液性能的影响；从材料去除率、表面粗糙度两方面对比了梅迪兰浓度对抛光性能的影响。结果表明：抛光液经0.26 wt.%梅迪兰改性后，其对玻璃的材料去除率达到最大值122nm/min，与未改性的抛光液相比增加了37%；经0.13 wt.%梅迪兰改性后的抛光液抛光后的玻璃表面粗糙度达到最小值0.928nm，与未改性的抛光液相比减小了32%。当梅迪兰浓度在0.13 wt.%~0.26 wt.%时，可以实现“快工出细活”，即在拥有高的材料去除率的同时获得低的表面粗糙度。 三、溶剂化膜和zeta电位对K9玻璃抛光性能的影响。评价了不同类型电解质的引入对抛光液性能的影响，主要是悬浮稳定性、粒度分布、颗粒表面zeta电 位等方面。探讨了电解质类型及浓度对玻璃抛光性能的影响。重要的是结合溶剂化膜及zeta电位提出了抛光过程中的界面相互作用机理，为抛光机理的研究做出一点贡献。; The surface quality of the optical component processing is one of the main factors limiting the increase of the load capacity of the high-power laser device, thus hindering the development of inertial confinement nuclear fusion. Ultra-smooth surface polishing technology is the most widely used surface processing technology in optical component processing. At present, there are many kinds of polishing methods that are more mature, of which chemical mechanical polishing (CMP) is the most widely used. It is a sophisticated composite processing method and is currently the only polishing technology that can provide global planarization. There are many factors that affect the polishing effect. The polishing fluid is a vital part of the polishing system. Its performance will directly determine the quality of the surface of the polished element. The properties of the slurry include particle size distribution, suspension stability, dispersibility, hardness of the abrasive particles, and synergy of various additives, etc. The additives in the slurry have a great influence on the performance of the slurry. Therefore, the deployment of the slurry is particularly important, and it is one of the research hotspots in the field of chemical mechanical polishing. This paper starts with solving the problem of nano-CeO2 particles agglomeration, adopts the surface modification method to improve the performance of the slurry, and discusses the effect of the concentration of the modifier on the polishing effect. The influence of the introduction of electrolytes on the performance of the slurry was studied, and the effect mechanism of the solvation film on the polishing process was proposed. The specific research content is as follows: 1. Surface modification of nano-CeO2 particles. In this paper, the surface modification was carried out using anionic surfactant-Medialan, and X-ray diffraction (XRD), Fourier Transform infrared spectroscopy (FTIR) analysis, Thermogravimetric analysis (TGA) and other material characterization methods proved that Medialan successfully grafted to the surface of the CeO2 particles without changing its crystal structure. 2. Effect of modified slurry on polishing properties of K9 optical glass. The influence of the concentration of Medialan on the performance of the slurry was evaluated from the particle size distribution and dispersibility of the slurry. The effect of the concentration of Medialan on the polishing performance was compared from the material removal rate and the surface roughness. The results show that the polishing rate of the slurry modified by 0.26 wt.% Medialan reached a maximum value of 122 nm/min, which is a 37% increase compared to the unmodified slurry. The surface roughness of the glass after polishing with the slurry modified by 0.13 wt.% Medialan reached a minimum value of 0.928 nm, which was reduced by 32% compared with the unmodified slurry. When the Medialan concentration is between 0.13 wt.% and 0.26 wt.%, "fine workmanship" can be achieved, ie, a low surface roughness can be obtained while having a high material removal rate. 3. Effect of solvation film and zeta potential on polishing properties of K9 glass. The influence of the introduction of different types of electrolytes on the performance of the slurry was evaluated, mainly including the stability of the suspension, the particle size distribution, and the zeta potential on the surface of the particles. The effect of electrolyte type and concentration on the polishing performance of glass was discussed. The interfacial interaction mechanisms at the abrasive particles and glass interface during the polishing process are elucidated considering the zeta potential and solvation film. |
| 学科主题 | 光学工程 |
| 内容类型 | 学位论文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/31075]  |
| 专题 | 中国科学院上海光学精密机械研究所 |
| 作者单位 | 中国科学院上海光学精密机械研究所 |
| 推荐引用方式 GB/T 7714 | 梁尚娟. 用于光学玻璃超光滑表面抛光的铈基抛光液的研究[D]. |
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