Subdiffraction plasmonic lens lithography prototype in stepper mode

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微细加工光学技术国家重点实验室（开放室）

	Subdiffraction plasmonic lens lithography prototype in stepper mode
	Liu, Minggang; Zhao, Chengwei; Luo, Yunfei; Zhao, Zeyu; Wang, Yanqin; Gao, Ping; Wang, Changtao; Luo, Xiangang
刊名	Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
	2017
卷号	35 期号:1 页码:011603
关键词	Lenses - Lithography - Metal working - Photolithography - Photoresists
ISSN号	1071-1023
英文摘要	In this paper, the authors present a low-cost and high-resolution lithography prototype by utilizing surface plasmons. In the surface plasmon lithography (SPL) prototype, a metal-photoresist-metal plasmonic cavity lens is adopted to amplify evanescent waves, thereby addressing the issues of poor fidelity, low contrast, and short working distance suffered from the conventional near-field optical lithography. The authors achieved the photoresist patterns with high resolution, high contrast, and high exposure depth experimentally by using an Hg lamp with 365 nm wavelength. Hole array patterns with radius of 50 nm and period of 160 nm were realized. Moreover, the grating array patterns with line width of 32(60) nm and period of 64(120) nm were successfully achieved. Furthermore, the authors introduced a step exposure method to fabricate a 5 × 5 array of grating patterns with a step length of 300 μm and the uniform patterns cover the whole area of about 2 × 2 mm2. Step exposure is valuable, which makes SPL have the ability to obtain a large-area pattern exposure, especially in the condition that the mask area is far smaller than the exposure region. It is believed that this prototype provides a low-cost, high-throughput, and high-resolution nanofabrication route for fabricating nanostructure devices. © 2016 American Vacuum Society.
语种	英语
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/8832]
专题	光电技术研究所_微细加工光学技术国家重点实验室（开放室）
作者单位	State Key Laboratory of Optical Technologies on Nano-fabrication and Micro-engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu; 610209, China
推荐引用方式 GB/T 7714	Liu, Minggang,Zhao, Chengwei,Luo, Yunfei,et al. Subdiffraction plasmonic lens lithography prototype in stepper mode[J]. Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics,2017,35(1):011603.
APA	Liu, Minggang.,Zhao, Chengwei.,Luo, Yunfei.,Zhao, Zeyu.,Wang, Yanqin.,...&Luo, Xiangang.(2017).Subdiffraction plasmonic lens lithography prototype in stepper mode.Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics,35(1),011603.
MLA	Liu, Minggang,et al."Subdiffraction plasmonic lens lithography prototype in stepper mode".Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics 35.1(2017):011603.