Positioning control system of three-dimensional wafer stage of lithography

doi:10.1117/12.2244874

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微电子装备总体研究室（四室）

	Positioning control system of three-dimensional wafer stage of lithography
	Tian, Peng 1,2; Yan, Wei 1,2; Yang, Fan 1,2; Li, Fanxing 1,2; Hu, Song 1,2
刊名	Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials
	2016
卷号	9685 页码:96850T
关键词	Closed Loop Systems Control Systems Lithography Manufacture Materials Testing Optical Devices Pulse Width Modulation Stepping Motors
ISSN号	0277-786X
DOI	10.1117/12.2244874
文献子类	C
英文摘要	Three-dimensional wafer stage is an important component of lithography. It is required to high positioning precision and efficiency. The closed-loop positioning control system, that consists of five-phase step motor and grating scale, implements rapid and precision positioning control of the three-dimensional wafer stage. The MCU STC15W4K32S4, which is possession of six independent PWM output channels and the pulse width, period is adjustable, is used to control the three axes. The stepper motor driver and grating scale are subdivided according to the precision of lithography, and grating scale data is transmitted to the computer for display in real time via USB communication. According to the lithography material, mask parameter, incident light intensity, it's able to calculate the speed of Z axis, and then get the value of PWM period based on the mathematical formula of speed and pulse period, finally realize high precision control. Experiments show that the positioning control system of three-dimensional wafer stage can meet the requirement of lithography, the closed-loop system is high stability and precision, strong practicability. © 2016 SPIE.
语种	英语
WOS记录号	WOS:000387429600029
资助机构	Chinese Academy of Sciences, Institute of Optics and Electronics (IOE) ; The Chinese Optical Society (COS)
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/8509]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan 2.610209, China 3.University of Chinese Academy of Sciences, Beijing 4.100049, China
推荐引用方式 GB/T 7714	Tian, Peng,Yan, Wei,Yang, Fan,et al. Positioning control system of three-dimensional wafer stage of lithography[J]. Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials,2016,9685:96850T.
APA	Tian, Peng,Yan, Wei,Yang, Fan,Li, Fanxing,&Hu, Song.(2016).Positioning control system of three-dimensional wafer stage of lithography.Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials,9685,96850T.
MLA	Tian, Peng,et al."Positioning control system of three-dimensional wafer stage of lithography".Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials 9685(2016):96850T.