Diode-end-pumped Ho, Pr:LiLuF4 bulk laser at 2.95 mu m

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 中科院强激光材料重点实验室

	Diode-end-pumped Ho, Pr:LiLuF4 bulk laser at 2.95 mu m
	Nie, Hongkun; Zhang, Peixiong; Zhang, Baitao; Yang, Kejian; Zhang, Lianhan; Li, Tao; Zhang, Shuaiyi; Xu, Jianqiu; Hang, Yin; He, Jingliang
刊名	Opt. Lett.
	2017
卷号	42 期号:4 页码:699
通讯作者	btzhang@sdu.edu.cn ; yhang@siom.ac.cn
英文摘要	A diode-end-pumped continuous-wave (CW) and passively Q-switched Ho, Pr : LiLuF4 (Ho, Pr: LLF) laser operation at 2.95 mu m was demonstrated for the first time, to the best of our knowledge. The maximum CW output power was 172 mW. By using a monolayer graphene as the saturable absorber, the passively Q-switched operation was realized, in which regimes with the highest output power, the shortest pulse duration, and the maximum repetition rate were determined to be 88 mW, 937.5 ns, and 55.7 kHz, respectively. The laser beam quality factor M-2 at the maximum CW output power were measured to be M-x(2) = 1.48 and M-y(2) = 1.47. (C) 2017 Optical Society of America
收录类别	SCI
资助信息	National Natural Science Foundation of China (NSFC) [61308042, 61675116, 61575110, 61405101, 51472257, 51321091]
WOS记录号	WOS:000394039500012
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/28049]
专题	上海光学精密机械研究所_中科院强激光材料重点实验室
作者单位	中国科学院上海光学精密机械研究所
推荐引用方式 GB/T 7714	Nie, Hongkun,Zhang, Peixiong,Zhang, Baitao,et al. Diode-end-pumped Ho, Pr:LiLuF4 bulk laser at 2.95 mu m[J]. Opt. Lett.,2017,42(4):699.
APA	Nie, Hongkun.,Zhang, Peixiong.,Zhang, Baitao.,Yang, Kejian.,Zhang, Lianhan.,...&He, Jingliang.(2017).Diode-end-pumped Ho, Pr:LiLuF4 bulk laser at 2.95 mu m.Opt. Lett.,42(4),699.
MLA	Nie, Hongkun,et al."Diode-end-pumped Ho, Pr:LiLuF4 bulk laser at 2.95 mu m".Opt. Lett. 42.4(2017):699.