Pixel-based mask optimization via particle swarm optimization algorithm for inverse lithography

	Pixel-based mask optimization via particle swarm optimization algorithm for inverse lithography
	Wang, Xiangzhao; Tang, Feng; Yang, Chaoxing; Li, Sikun; Wang, Lei
	2016
通讯作者	wxz26267@siom.ac.cn
英文摘要	An efficient pixel-based mask optimization method via particle swarm optimization (PSO) algorithm for inverse lithography is proposed. Because of the simplicity of principles, the ease of implementation and the efficiency of convergence, PSO has been widely used in many fields. In this study, PSO is used to solve the inverse problem of mask optimization. The pixel-based mask patterns are transformed into frequency space using discrete cosine transformation and the frequency components are encoded into particles. The pattern fidelity is adopted as the fitness function to evaluate these particles. The mask optimization method is implemented by updating the velocities and positions of these particles. Simulation results show that the image fidelity has been efficiently improved after using the proposed method.
会议录	OPTICAL MICROLITHOGRAPHY XXIX
语种	英语
ISSN号	0277-786X
内容类型	会议论文
源URL	[http://ir.siom.ac.cn/handle/181231/27337]
专题	上海光学精密机械研究所_信息光学与光电技术实验室
推荐引用方式 GB/T 7714	Wang, Xiangzhao,Tang, Feng,Yang, Chaoxing,et al. Pixel-based mask optimization via particle swarm optimization algorithm for inverse lithography[C]. 见:.