Growth and characterization of AlN epilayers using pulsed metal organic chemical vapor deposition

	Growth and characterization of AlN epilayers using pulsed metal organic chemical vapor deposition
	Zesheng Ji; Lianshan Wang; Guijuan Zhao; Yulin Meng; Fangzheng Li; Huijie Li; Shaoyan Yang; Zhanguo Wang
刊名	Chinese Physics B
	2017
卷号	26 期号:7 页码:078102
学科主题	半导体材料
公开日期	2018-05-23
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/28309]
专题	半导体研究所_中科院半导体材料科学重点实验室
推荐引用方式 GB/T 7714	Zesheng Ji,Lianshan Wang,Guijuan Zhao,et al. Growth and characterization of AlN epilayers using pulsed metal organic chemical vapor deposition[J]. Chinese Physics B,2017,26(7):078102.
APA	Zesheng Ji.,Lianshan Wang.,Guijuan Zhao.,Yulin Meng.,Fangzheng Li.,...&Zhanguo Wang.(2017).Growth and characterization of AlN epilayers using pulsed metal organic chemical vapor deposition.Chinese Physics B,26(7),078102.
MLA	Zesheng Ji,et al."Growth and characterization of AlN epilayers using pulsed metal organic chemical vapor deposition".Chinese Physics B 26.7(2017):078102.