Spectroscopy for identification of plasma sources for lithography and water window imaging

	Spectroscopy for identification of plasma sources for lithography and water window imaging
	O'Sullivan, G; Dunne, P; Higashiguchi, T; Li, BW; Lokasani, R; Long, E; Ohashi, H; O'Reilly, F; Sheridan, P; Sheil, J
	2015
会议名称	29th International Conference on Photonic, Electronic, and Atomic Collisions (ICPEAC)
会议日期	JUL 22-28, 2015
会议地点	Toledo, SPAIN
卷号	635
通讯作者	O'Sullivan, G (reprint author), Univ Coll Dublin Belfield, Sch Phys, Dublin 4, Ireland.
会议录	Journal of Physics: Conference Series/XXIX INTERNATIONAL CONFERENCE ON PHOTONIC, ELECTRONIC, AND ATOMIC COLLISIONS (ICPEAC2015), PTS 1-12
会议录出版地	BRISTOL
学科主题	Engineering; Optics; Physics
语种	英语
ISSN号	1742-6588
WOS记录号	WOS:000366407000472
内容类型	会议论文
源URL	[http://ir.lzu.edu.cn/handle/262010/184943]
专题	核科学与技术学院_会议论文
推荐引用方式 GB/T 7714	O'Sullivan, G,Dunne, P,Higashiguchi, T,et al. Spectroscopy for identification of plasma sources for lithography and water window imaging[C]. 见:29th International Conference on Photonic, Electronic, and Atomic Collisions (ICPEAC). Toledo, SPAIN. JUL 22-28, 2015.