Nonadiabatic dynamics in energetic negative fluorine ions scattering from a Si(100) surface

	Nonadiabatic dynamics in energetic negative fluorine ions scattering from a Si(100) surface
	Chen, L; Qiu, SL; Xiong, FF; Lu, JJ; Liu, PY; Ding, B; Li, Y; Cui, Y; Guo, YL; Chen, XM
刊名	JOURNAL OF CHEMICAL PHYSICS
	2015-09-21
卷号	143 期号:11
ISSN号	0021-9606
通讯作者	Guo, YL (reprint author), Lanzhou Univ, Sch Nucl Sci & Technol, Lanzhou 730000, Peoples R China.
学科主题	Chemistry; Physics
出版地	MELVILLE
语种	英语
WOS记录号	WOS:000361843900049
内容类型	期刊论文
源URL	[http://ir.lzu.edu.cn/handle/262010/180966]
专题	核科学与技术学院_期刊论文
推荐引用方式 GB/T 7714	Chen, L,Qiu, SL,Xiong, FF,et al. Nonadiabatic dynamics in energetic negative fluorine ions scattering from a Si(100) surface[J]. JOURNAL OF CHEMICAL PHYSICS,2015,143(11).
APA	Chen, L.,Qiu, SL.,Xiong, FF.,Lu, JJ.,Liu, PY.,...&Chen, XM.(2015).Nonadiabatic dynamics in energetic negative fluorine ions scattering from a Si(100) surface.JOURNAL OF CHEMICAL PHYSICS,143(11).
MLA	Chen, L,et al."Nonadiabatic dynamics in energetic negative fluorine ions scattering from a Si(100) surface".JOURNAL OF CHEMICAL PHYSICS 143.11(2015).