Computer simulation of 3D mask image based on self-adaptive model in VLSI lithography

	Computer simulation of 3D mask image based on self-adaptive model in VLSI lithography
	Peng, Fei Cao; Lin, Cheng; Xiao, Ping Zhang
	2009
会议名称	2009 WRI World Congress on Computer Science and Information Engineering, CSIE 2009
会议日期	March 31, 2009 - April 2, 2009
会议地点	Los Angeles, CA, United states
关键词	Three dimensional Computer science Lithography Simulators Systems engineering 3D masks Aerial images Electromagnetic simulation Gaussian filters Hopkins Image-based Lithography process Lithography systems Off-axis illumination Scalar quantities Self-adaptive models TE wave Transmission cross coefficient
卷号	3
页码	484-487
通讯作者	Peng, F. C.
会议录	2009 WRI World Congress on Computer Science and Information Engineering, CSIE 2009
会议录出版地	Piscataway
学科主题	Computer Systems and Equipment; Computer Software, Data Handling and Applications;Computer Applications;Engineering Graphics; Industrial Engineering and Management; Systems Science; Computer Circuits and Logic Elements; Nuclear Reactors;Automobiles
语种	英语
内容类型	会议论文
源URL	[http://ir.lzu.edu.cn/handle/262010/183433]
专题	信息科学与工程学院_会议论文
推荐引用方式 GB/T 7714	Peng, Fei Cao,Lin, Cheng,Xiao, Ping Zhang. Computer simulation of 3D mask image based on self-adaptive model in VLSI lithography[C]. 见:2009 WRI World Congress on Computer Science and Information Engineering, CSIE 2009. Los Angeles, CA, United states. March 31, 2009 - April 2, 2009.