Deposition of low dielectric constant SiOC films by using an atmospheric pressure microplasma jet

	Deposition of low dielectric constant SiOC films by using an atmospheric pressure microplasma jet
刊名	JOURNAL OF PHYSICS D-APPLIED PHYSICS
	2009-06-21
卷号	42 期号:12 页码:-
ISSN号	0022-3727
通讯作者	Ding, Y (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
学科主题	Physics
语种	英语
WOS记录号	WOS:000266639300056
内容类型	期刊论文
源URL	[http://202.201.7.4/handle/262010/104742]
专题	物理科学与技术学院_期刊论文
推荐引用方式 GB/T 7714	. Deposition of low dielectric constant SiOC films by using an atmospheric pressure microplasma jet[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2009,42(12):-.
APA	(2009).Deposition of low dielectric constant SiOC films by using an atmospheric pressure microplasma jet.JOURNAL OF PHYSICS D-APPLIED PHYSICS,42(12),-.
MLA	"Deposition of low dielectric constant SiOC films by using an atmospheric pressure microplasma jet".JOURNAL OF PHYSICS D-APPLIED PHYSICS 42.12(2009):-.