Reaction mechanism of atomic layer deposition of Al on the Si(100) surface: A density functional theory study

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	Reaction mechanism of atomic layer deposition of Al on the Si(100) surface: A density functional theory study
	Dong, Mao Jin; Fang, Ran; Xiong, Yu Qing; Wang, Duo Shu; Wang, Ji Zhou; Li, Chen; Zhang, Ling
刊名	Advanced Materials Research
	2014
卷号	941-944 页码:1283-1287
关键词	Activation barriers Adsorption energies Chemical adsorption Density functional theory studies Endothermic reactions Process mechanisms Reaction mechanism Trimethyl aluminums
ISSN号	10226680
学科主题	Aluminum;Single Element Semiconducting Materials;Physical Chemistry;Chemical Reactions;Chemical Operations;Probability Theory
语种	英语
内容类型	期刊论文
源URL	[http://ir.lzu.edu.cn/handle/262010/177915]
专题	化学化工学院_期刊论文
推荐引用方式 GB/T 7714	Dong, Mao Jin,Fang, Ran,Xiong, Yu Qing,et al. Reaction mechanism of atomic layer deposition of Al on the Si(100) surface: A density functional theory study[J]. Advanced Materials Research,2014,941-944:1283-1287.
APA	Dong, Mao Jin.,Fang, Ran.,Xiong, Yu Qing.,Wang, Duo Shu.,Wang, Ji Zhou.,...&Zhang, Ling.(2014).Reaction mechanism of atomic layer deposition of Al on the Si(100) surface: A density functional theory study.Advanced Materials Research,941-944,1283-1287.
MLA	Dong, Mao Jin,et al."Reaction mechanism of atomic layer deposition of Al on the Si(100) surface: A density functional theory study".Advanced Materials Research 941-944(2014):1283-1287.