Soft magnetic property of [Fe80Ni20-O/ZnO] n multilayer thin films for high-frequency application | |
Wang, Y. ; Geng, H. ; Nie, S.J. ; Wei, J.Q. ; Wang, L.S. ; Yue, G.H. ; Chen, Y. ; Peng, D.L. ; Wang LS(王来森) ; Peng DL(彭栋梁) | |
2012 | |
关键词 | Manufacture Monolayers Silicon wafers Substrates Zinc oxide |
英文摘要 | Conference Name:3rd International Conference on Manufacturing Science and Engineering, ICMSE 2012. Conference Address: Xiamen, China. Time:March 27, 2012 - March 29, 2012.; Fujian University of Technology; Xiamen University; Fuzhou University; Huaqiao University; University of Wollongong; A series of [Fe80Ni20-O/ZnO]n multilayer thin films with different ZnO separate layer thicknesses (t, from 0 to 3 nm) and fixed Fe80Ni20-O layer thickness (about 5 nm) have been fabricated on (100)-oriented silicon wafers and glass substrates by reactive magnetron sputtering. Microstructure analysis and static magnetic measurement results indicate that the magnetic properties of the films can be adjusted by the variation of ZnO monolayers thickness. All films reveal an evident in-plane uniaxial magnetic anisotropy (IPUMA). The values of in-plane uniaxial magnetic anisotropy fields (Hk) and resistivity (ρ) can be changed from 8 to 57 Oe and 62 to 168 μΩ•cm respectively with the t increasing. While the values of hard axis coercivity (Hch) and easy axis coercivity (Hce) reveal minimums of 1.5 and 3 Oe respectively at t = 1 nm. |
语种 | 英语 |
出处 | http://dx.doi.org/10.4028/www.scientific.net/AMR.476-478.2335 |
出版者 | Trans Tech Publications |
内容类型 | 其他 |
源URL | [http://dspace.xmu.edu.cn/handle/2288/85133] |
专题 | 材料学院-会议论文 |
推荐引用方式 GB/T 7714 | Wang, Y.,Geng, H.,Nie, S.J.,et al. Soft magnetic property of [Fe80Ni20-O/ZnO] n multilayer thin films for high-frequency application. 2012-01-01. |
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