电化学方法制备铜钴纳米多层膜

CORC > 厦门大学 > 1996年第2卷

	电化学方法制备铜钴纳米多层膜; Electrodeposition of Cu-Co Multilayer Thin Films
	薛江云 ; 吴继勋 ; 杨德钧 ; Xue Jiangyun ; Wu Jixun ; Yang Dejun
刊名	http://electrochem.xmu.edu.cn/CN/abstract/abstract9630.shtml
	1996-08-28
关键词	电沉积铜钴合金纳米多层膜 Electro-deposition Copper-Cobalt alloy Multilayer
英文摘要	采用旋转圆盘电极、双脉冲电位法从单一的含有铜离子和钴离子的镀液中电沉积Ｃｕ－Ｃｏ纳米多层膜、并用ＴＥＭ．ＡＥＳ和Ｘ－射线衍射研究镀层的形貌和组成。结果表明：多层膜结构为纯铜和含有少量铜的铜钴合金层交替组成，铜在钴层中的含量，随镀液中的铜含量的增大和转速的提高而提高。; A method has been developed to produce Cu-Co Multilayer from a single electrolyte by electredeposition. The effects of the concentration of copper ions,current density and the speed of rotation were investigated,and the Cu-Co electrodeposition films were analysed by TEM. AES and X-ray diffraction.The results indicated that the film was alternating pure copper and coppercobalt alloy layers. If the content of copper in cobalt layer is to be small,the concentration of its ions in solution must be small and the rotation speed must be low.; 作者联系地址：北京科技大学表面科学与腐蚀工程系; Author's Address: Department of Surface Science and Corrosion Engineering,University of Science and Technology,Beijing 100083
语种	中文
出版者	厦门大学《电化学》编辑部
内容类型	期刊论文
源URL	[http://dspace.xmu.edu.cn/handle/2288/57217]
专题	1996年第2卷
推荐引用方式 GB/T 7714	薛江云,吴继勋,杨德钧,等. 电化学方法制备铜钴纳米多层膜, Electrodeposition of Cu-Co Multilayer Thin Films[J]. http://electrochem.xmu.edu.cn/CN/abstract/abstract9630.shtml,1996.
APA	薛江云,吴继勋,杨德钧,Xue Jiangyun,Wu Jixun,&Yang Dejun.(1996).电化学方法制备铜钴纳米多层膜.http://electrochem.xmu.edu.cn/CN/abstract/abstract9630.shtml.
MLA	薛江云,et al."电化学方法制备铜钴纳米多层膜".http://electrochem.xmu.edu.cn/CN/abstract/abstract9630.shtml (1996).