掺铒硫化锌薄膜界面态及其对驰豫发光影响的研究

CORC > 厦门大学 > 1995年第1卷

	掺铒硫化锌薄膜界面态及其对驰豫发光影响的研究; Study on the Surface States of Zinc Sulfide Thin Film Doped with Erbium and their Effect on the Relaxation Luminance
	王余姜 ; 柳兆洪 ; 陈振湘 ; Wang Yujiang ; Liu Zhaohong ; Chen Zhenxiang
刊名	http://electrochem.xmu.edu.cn/CN/abstract/abstract9715.shtml
	1995-08-28
关键词	硫化锌薄膜氧吸附驰豫发光 ZnS thin film Absorption of oxygen Relaxation luminance
英文摘要	应用ＸＰＳ及电容－电压测试研究硫化锌薄膜的界面态，采用电脉冲瞬态激发技术研究Ｅｒ￣（３＋）激活的ＺｎＳ薄膜特征跃迁非指数衰减过程的弛豫发光，分析了由于氧吸附形成的界面态对弛豫发光的影响。; X-ray photoelectron spectrum and characteristics of the capacity,versus thevoltage of the thin film devices are measured to study the surface states of the zinc sulfide thin film.The transient electroluminescence excited by pulses shows the relaxation luminance peaks during anon-exponential decay process of the characteristic transitions activated by Er￣(3+) in the ZnS directcurrent thin film electroluminescence (DCTFEL) devices.The surface structures of ZnS:Cu,Cl,Erfilm with the absorption of oxygen,and the effect of the surface states on the relaxation luminance ofthe devices are discussed.; 作者联系地址：厦门大学物理学系; Author's Address: Dept.of Phys.Xiamen Unive.,Xiamen,361005
语种	中文
出版者	厦门大学《电化学》编辑部
内容类型	期刊论文
源URL	[http://dspace.xmu.edu.cn/handle/2288/57142]
专题	1995年第1卷
推荐引用方式 GB/T 7714	王余姜,柳兆洪,陈振湘,等. 掺铒硫化锌薄膜界面态及其对驰豫发光影响的研究, Study on the Surface States of Zinc Sulfide Thin Film Doped with Erbium and their Effect on the Relaxation Luminance[J]. http://electrochem.xmu.edu.cn/CN/abstract/abstract9715.shtml,1995.
APA	王余姜,柳兆洪,陈振湘,Wang Yujiang,Liu Zhaohong,&Chen Zhenxiang.(1995).掺铒硫化锌薄膜界面态及其对驰豫发光影响的研究.http://electrochem.xmu.edu.cn/CN/abstract/abstract9715.shtml.
MLA	王余姜,et al."掺铒硫化锌薄膜界面态及其对驰豫发光影响的研究".http://electrochem.xmu.edu.cn/CN/abstract/abstract9715.shtml (1995).