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	The structural and electrochemical properties of tin oxide films prepared by RF magnetron sputtering - art no 69842H
	Cai, Minzhen ; Song, Jie ; Zhang, Liangtang ; Wu, Qihui ; Wu, Suntao ; Wu QH(吴启辉)
	2008
关键词	THIN-FILMS SNO2 LITHIUM ELECTRODES BATTERIES OXYGEN ANODE
英文摘要	Conference Name:6th International Conference on Thin Film Physics and Applications. Conference Address: Shanghai, PEOPLES R CHINA. Time:SEP 25-28, 2007.; Tin oxide thin films have been deposited on oxide silicon substrates using a RF magnetron sputtering process with various sputtering power. The crystal structures of the tin oxide thin films were characterized and analyzed by X-ray diffraction. The surface morphology of the films were observed by SEM. The electrochemical properties of the films were also tested by constant current charge and discharge cycle tests. The results of XRD indicate that all the films are crystalline. The results of SEM exhibit that the grain size of surface expands as sputtering power rises.
语种	英语
出处	http://dx.doi.org/10.1117/12.792136
出版者	P SOC PHOTO-OPT INS
内容类型	其他
源URL	[http://dspace.xmu.edu.cn/handle/2288/86074]
专题	物理技术－会议论文
推荐引用方式 GB/T 7714	Cai, Minzhen,Song, Jie,Zhang, Liangtang,et al. The structural and electrochemical properties of tin oxide films prepared by RF magnetron sputtering - art no 69842H. 2008-01-01.

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