High precision electrochemical micromachining based on confined etchant layer technique | |
Lai, Lei-Jie ; Zhou, Hang ; Du, Yu-Jie ; Zhang, Jie ; Jia, Jing-Chun ; Jiang, Li-Min ; Zhu, Li-Min ; Tian, Zhao-Wu ; Tian, Zhong-Qun ; Zhan, Dong-Ping ; Tian ZW(田昭武) ; Tian ZQ(田中群) ; Zhan DP(詹东平) | |
刊名 | http://dx.doi.org/10.1016/j.elecom.2012.12.017 |
2013 | |
关键词 | N-GAAS MICROFABRICATION |
英文摘要 | National Natural Science Foundation of China [91023047, 91023006, 21021002]; Natural Science Foundation of Fujian Province of China [2012J06004]; Fundamental Research Funds for the Central Universities [2010121022]; Scientific Research Foundation for the Returned Overseas Chinese Scholars (State Education Ministry); High-quality products come from high-quality instrument. We present here an optimized instrument for electrochemical micromachining, in which a granite bridge base, a macro-micro dual driven positioning stage and a force-displacement sensing module are combined to promote dramatically the tool-workpiece alignment, in-situ monitoring and product quality. As a testing experiment, a polymethylmethacrylate (PMMA) microlens array with a diameter of 110 mu m and a height of 3.5 mu m has been transferred successfully onto the surface of an n-GaAs wafer by the confined etchant layer technique (CELT). The machining tolerance is about 3.4 nm and the surface roughness is lower than 8.0 nm. Moreover, the presented techniques have significance in the precise electrochemical instruments for not only micromachining but also scanning electrochemical probe techniques. (c) 2012 Elsevier B.V. All rights reserved. |
语种 | 英语 |
出版者 | ELSEVIER SCIENCE INC |
内容类型 | 期刊论文 |
源URL | [http://dspace.xmu.edu.cn/handle/2288/88651] |
专题 | 化学化工-已发表论文 |
推荐引用方式 GB/T 7714 | Lai, Lei-Jie,Zhou, Hang,Du, Yu-Jie,et al. High precision electrochemical micromachining based on confined etchant layer technique[J]. http://dx.doi.org/10.1016/j.elecom.2012.12.017,2013. |
APA | Lai, Lei-Jie.,Zhou, Hang.,Du, Yu-Jie.,Zhang, Jie.,Jia, Jing-Chun.,...&詹东平.(2013).High precision electrochemical micromachining based on confined etchant layer technique.http://dx.doi.org/10.1016/j.elecom.2012.12.017. |
MLA | Lai, Lei-Jie,et al."High precision electrochemical micromachining based on confined etchant layer technique".http://dx.doi.org/10.1016/j.elecom.2012.12.017 (2013). |
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