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	Influence of SiO2 additional layers on the laser induced damage threshold of Ta2O5 films
	Xu Cheng ; Li Dawei ; Ma JY(麻健勇) ; Jin Yunxia ; Shao JD(邵建达) ; Fan ZX(范正修)
刊名	opt. laser technol.
	2008
卷号	40期号:3页码:545
关键词	Ta2O5 films laser induced damage threshold absorption SiO2 additional layers
ISSN号	0030-3992
中文摘要	a series or ta2o5 films with different sio2 additional layers including overcoat, undercoat and interlayer was prepared by electron beam evaporation under the same deposition process. absorption of samples was measured using the surface thermal lensing (stl) technique. the electric field distributions of the samples were theoretical predicted using thin film design software (tfcalc). the laser induced damage threshold (lidt) was assessed using an nd:yag laser operating at 1064 nm with a pulse length of 12 ns. it was found that sio2 additional layers resulted in a slight increase of the absorption, whereas they exerted little influence on the microdefects. the electric field distribution among the samples was unchanged by adding an sio2 overcoat and undercoat, yet was changed by adding an interlayer. sio2 undercoat. the interlayer improved the lidt greatly, whereas the sio2 overcoat had little effect on the lidt. (c) 2007 elsevier ltd. all rights reserved.
学科主题	光学薄膜
收录类别	EI
语种	英语
公开日期	2009-09-22
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/4738]
专题	上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式 GB/T 7714	Xu Cheng,Li Dawei,Ma JY,et al. Influence of SiO2 additional layers on the laser induced damage threshold of Ta2O5 films[J]. opt. laser technol.,2008,40(3):545, 549.
APA	Xu Cheng,Li Dawei,麻健勇,Jin Yunxia,邵建达,&范正修.(2008).Influence of SiO2 additional layers on the laser induced damage threshold of Ta2O5 films.opt. laser technol.,40(3),545.
MLA	Xu Cheng,et al."Influence of SiO2 additional layers on the laser induced damage threshold of Ta2O5 films".opt. laser technol. 40.3(2008):545.

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