Electric field distribution in resonant reflection filters under normal incidence

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 光学薄膜技术研究与发展中心

	Electric field distribution in resonant reflection filters under normal incidence
	Sun Tianyu ; Ma JY(麻健勇) ; Wang Jianpeng ; Jin Yunxia ; He HB(贺洪波) ; Shao JD(邵建达) ; Fan ZX(范正修)
刊名	j. opt. a-pure appl. opt.
	2008
卷号	10 期号:12 页码:125003
关键词	near field distributions electric field enhancement resonant grating waveguide structures planar periodic waveguide rigorous coupled-wave analysis Fourier model method
ISSN号	1464-4258
中文摘要	electric field distributions inside resonant reflection filters constructed using planar periodic waveguides are investigated in this paper. the electric fields may be intensified by resonance effects. although the resonant reflection peaks can be quite narrow using weakly modulated planar periodic waveguides, the strong electric field enhancement limits their use in high-power laser systems. strongly modulated waveguides may be used to reduce the electric field enhancement and a cover layer may be used to narrow the bandwidth at the same time. desired results (i.e. almost no electric field enhancement together with narrow bandwidth) can be realized using this simple structure.
学科主题	光学薄膜
资助信息	national natural science foundation of china [10704079]
语种	英语
WOS记录号	WOS:000261114800003
公开日期	2009-09-22
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/4718]
专题	上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式 GB/T 7714	Sun Tianyu,Ma JY,Wang Jianpeng,et al. Electric field distribution in resonant reflection filters under normal incidence[J]. j. opt. a-pure appl. opt.,2008,10(12):125003.
APA	Sun Tianyu.,麻健勇.,Wang Jianpeng.,Jin Yunxia.,贺洪波.,...&范正修.(2008).Electric field distribution in resonant reflection filters under normal incidence.j. opt. a-pure appl. opt.,10(12),125003.
MLA	Sun Tianyu,et al."Electric field distribution in resonant reflection filters under normal incidence".j. opt. a-pure appl. opt. 10.12(2008):125003.