Temperature fields of 355 nm HR coatings based on the interface absorption model

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 光学薄膜技术研究与发展中心

	Temperature fields of 355 nm HR coatings based on the interface absorption model
	Zhan MQ(占美琼) ; Shao JD(邵建达)
刊名	j. phys. d-appl. phys.
	2008
卷号	41 期号:4 页码:45306
关键词	Damage mechanism Deposition temperatures Extinction coefficient High reflectance coating Interface absorption models
ISSN号	0022-3727
中文摘要	temperature fields of 355 nm high-reflectance (hr) coatings were investigated based on the interface absorption model. it was found that the highest temperature in the hr coatings increased with an increase in the extinction coefficient of the interface a, b, c, al2o3 and mgf2. the highest temperature of hr coatings that can be reached increased quickly with the increase in the extinction coefficient of interface a in particular. the temperature rises of 355 nm hr coatings at different layers and different deposition temperatures were investigated based on experiments also. the damage mechanism of 355 nm hr coatings was confirmed with temperature fields and the interface absorption model.
学科主题	光学薄膜
收录类别	EI
语种	英语
WOS记录号	WOS:000253177900027
公开日期	2009-09-22
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/4682]
专题	上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式 GB/T 7714	Zhan MQ,Shao JD. Temperature fields of 355 nm HR coatings based on the interface absorption model[J]. j. phys. d-appl. phys.,2008,41(4):45306.
APA	占美琼,&邵建达.(2008).Temperature fields of 355 nm HR coatings based on the interface absorption model.j. phys. d-appl. phys.,41(4),45306.
MLA	占美琼,et al."Temperature fields of 355 nm HR coatings based on the interface absorption model".j. phys. d-appl. phys. 41.4(2008):45306.