Effects of oxygen partial pressure on packing density and laser damage threshold of TiO2 thin films
Yao JK(姚建可) ; Fan ZX(范正修) ; Jin Yunxia ; Zhao Yuanan ; He HB(贺洪波) ; Shao JD(邵建达)
刊名j. appl. phys.
2007
卷号102期号:6页码:63105
关键词Electron beams Laser damage Partial pressure Stoichiometry Threshold voltage Titanium dioxide
ISSN号0021-8979
中文摘要tio2 films are deposited by electron beam evaporation as a function of oxygen partial pressure. the packing density, refractive index, and extinction coefficient all decrease with the increase of pressure, which also induces the change of the film's microstructure, such as the increase of voids and h2o concentration in the film. the laser-induced damage threshold (lidt) of the film increases monotonically with the rise of pressure in this experiment. the porous structure and low nonstoichiometric defects absorption contribute to the film's high lidt. the films prepared at the lowest and the highest pressure show nonstoichiometric and surface-defects-induced damage features, respectively.(c) 2007 american institute of physics.
学科主题光学薄膜
收录类别EI
语种英语
WOS记录号WOS:000249787200005
公开日期2009-09-22
内容类型期刊论文
源URL[http://ir.siom.ac.cn/handle/181231/4524]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
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GB/T 7714
Yao JK,Fan ZX,Jin Yunxia,et al. Effects of oxygen partial pressure on packing density and laser damage threshold of TiO2 thin films[J]. j. appl. phys.,2007,102(6):63105.
APA 姚建可,范正修,Jin Yunxia,Zhao Yuanan,贺洪波,&邵建达.(2007).Effects of oxygen partial pressure on packing density and laser damage threshold of TiO2 thin films.j. appl. phys.,102(6),63105.
MLA 姚建可,et al."Effects of oxygen partial pressure on packing density and laser damage threshold of TiO2 thin films".j. appl. phys. 102.6(2007):63105.
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