多层介质膜脉冲压缩光栅近场光学特性分析
刘世杰 ; 沈健 ; 沈自才 ; 孔伟金 ; 魏朝阳 ; 晋云霞 ; 邵建达 ; 范正修
刊名物理学报
2006
卷号55期号:9页码:4588
关键词衍射光学 多层介质膜光栅 模式理论 损伤阈值 diffractive optics multi-layer dielectric gratings Fourier modal method laser induced damage threshold
ISSN号1000-3290
其他题名Near-field optical property of multi-layer dielectric gratings for pulse compressor
中文摘要利用傅里叶模式理论分析了TE波自准直角入射的使用条件下,多层介质膜光栅的光栅区和多层膜区电场分布的特点.分别讨论了HfO2和SiO2为顶层光栅材料时,光栅结构参数对光栅脊峰值电场的影响,结果表明,对于不同膜厚的顶层材料,存在一个最佳膜厚度,使光栅脊峰值电场最小,并且当膜厚增大时,设计大高宽比的光栅可以降低该电场峰值.最后,在大角度条件下使用多层膜光栅也可以降低光栅脊处的峰值电场.; Multi-layer dielectric gratings for pulse compressor in high-energy laser system must provide high diffraction efficiency. In addition, its laser induced damage property is critical for the system. Nonuniform optical near-field distribution of multi-layer dielectric gratings is one of the important factors to limit its laser induced damage threshold. Electric field distributions in the grating region and multi-layer film region are analyzed by using Fourier modal method. Effects of grating structure on peak magnitude of electric field in grating ridge are analyzed when the top layer material is HfO2 and SiO2, respectively. The results show that there exists an optimum top layer thickness, at which the peak magnitude of electric field within grating ridge is a minimum. And the peak electric field in the grating ridge can be reduced by designing top gratings with high aspect ratio structure when top layer thickness is increasing. Finally, the peak electric field in the grating ridge can also be reduced when the multi-layer dielectric grating is used at big incident angle.
学科主题光学薄膜
分类号TN202
收录类别ei
语种中文
公开日期2009-09-22
内容类型期刊论文
源URL[http://ir.siom.ac.cn/handle/181231/4302]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714
刘世杰,沈健,沈自才,等. 多层介质膜脉冲压缩光栅近场光学特性分析[J]. 物理学报,2006,55(9):4588, 4594.
APA 刘世杰.,沈健.,沈自才.,孔伟金.,魏朝阳.,...&范正修.(2006).多层介质膜脉冲压缩光栅近场光学特性分析.物理学报,55(9),4588.
MLA 刘世杰,et al."多层介质膜脉冲压缩光栅近场光学特性分析".物理学报 55.9(2006):4588.
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