Performance of an improved logarithmic phase mask with optimized parameters in a wavefront-coding system
Zhao, Hui; Li, Yingcai
刊名applied optics
2010-01-10
卷号49期号:2页码:229-238
ISSN号0003-6935
合作状况国内
英文摘要in two papers [proc. spie 4471, 272-280 (2001) and appl. opt. 43, 2709-2721 (2004)], a logarithmic phase mask was proposed and proved to be effective in extending the depth of field; however, according to our research, this mask is not that perfect because the corresponding defocused modulation transfer function has large oscillations in the low-frequency region, even when the mask is optimized. so, in a previously published paper [opt. lett. 33, 1171-1173 (2008)], we proposed an improved logarithmic phase mask by making a small modification. the new mask can not only eliminate the drawbacks to a certain extent but can also be even less sensitive to focus errors according to fisher information criteria. however, the performance comparison was carried out with the modified mask not being optimized, which was not reasonable. in this manuscript, we optimize the modified logarithmic phase mask first before analyzing its performance and more convincing results have been obtained based on the analysis of several frequently used metrics. (c) 2010 optical society of america
学科主题计算机应用其他学科(含图像处理)
WOS标题词science & technology ; physical sciences
类目[WOS]optics
研究领域[WOS]optics
关键词[WOS]field ; depth ; extend
收录类别SCI ; EI
资助信息(973 program) 2009cb724006
语种英语
WOS记录号WOS:000273880100011
公开日期2010-12-09
内容类型期刊论文
源URL[http://ir.opt.ac.cn/handle/181661/8388]  
专题西安光学精密机械研究所_空间光学应用研究室
作者单位Chinese Acad Sci, Space Opt Lab, Xian Inst Opt & Precis Mech, Xian, Peoples R China
推荐引用方式
GB/T 7714
Zhao, Hui,Li, Yingcai. Performance of an improved logarithmic phase mask with optimized parameters in a wavefront-coding system[J]. applied optics,2010,49(2):229-238.
APA Zhao, Hui,&Li, Yingcai.(2010).Performance of an improved logarithmic phase mask with optimized parameters in a wavefront-coding system.applied optics,49(2),229-238.
MLA Zhao, Hui,et al."Performance of an improved logarithmic phase mask with optimized parameters in a wavefront-coding system".applied optics 49.2(2010):229-238.
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