Opacity studies of silicon in radiatively heated plasma

	Opacity studies of silicon in radiatively heated plasma
	Wei, H. G.1,3; Shi, J. R.1; Zhao, G.1 ; Zhang, Yi 2; Dong, Quan-Li 2; Li, Yu-Tong 2; Wang, Shou-Jun 2; Zhang, Jie 2,6; Liang, Zuotang 3; Zhang, Ji-Yan 4
刊名	ASTROPHYSICAL JOURNAL
	2008-08-10
卷号	683 期号:1 页码:577-583
关键词	atomic data methods : laboratory plasmas X-rays : general
英文摘要	Measurements of the opacity of silicon at high temperature and high density are reported. A silicon dioxide foam was heated by eight nanosecond laser beams while a backlighter X-ray source was produced with a picosecond laser. Absorptions of the 1-2 transitions of Si XII through Si VI were observed in the wavelength range from 6.6 to 7.1 angstrom. The experimental results are simulated with theoretical calculations under local thermodynamic equilibrium using a detailed level accounting model and can be reproduced in general when the effects of the oxygen in the SiO2 are taken into account.
收录类别	SCI
语种	英语
WOS记录号	WOS:000258296100049
内容类型	期刊论文
源URL	[http://ir.bao.ac.cn/handle/114a11/7382]
专题	国家天文台_光学天文研究部
作者单位	1.Chinese Acad Sci, Natl Astron Observ, Beijing 100012, Peoples R China 2.Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Lab Opt Phys, Beijing 100080, Peoples R China 3.Shandong Univ, Dept Phys, Jinan 250100, Peoples R China 4.China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Peoples R China 5.Osaka Univ, Inst Laser Engn, Suita, Osaka 5650871, Japan 6.Jiao Tong Univ, Dept Phys, Shanghai 200030, Peoples R China
推荐引用方式 GB/T 7714	Wei, H. G.,Shi, J. R.,Zhao, G.,et al. Opacity studies of silicon in radiatively heated plasma[J]. ASTROPHYSICAL JOURNAL,2008,683(1):577-583.
APA	Wei, H. G..,Shi, J. R..,Zhao, G..,Zhang, Yi.,Dong, Quan-Li.,...&Takabe, Hideaki.(2008).Opacity studies of silicon in radiatively heated plasma.ASTROPHYSICAL JOURNAL,683(1),577-583.
MLA	Wei, H. G.,et al."Opacity studies of silicon in radiatively heated plasma".ASTROPHYSICAL JOURNAL 683.1(2008):577-583.