Effects of Si-doping on field emission characteristics of AlN films grown on n-type 6H-SiC by MOCVD
Liang, F.; Chen, P.; Zhao, D.G.; Jiang, D.S.; Liu, Z.S.; Zhu, J.J.; Yang, J.; Liu, W.; Li, X.; Liu, S.T.
刊名Materials Technology
2016
通讯作者Chen, P.
收录类别EI
语种英语
内容类型期刊论文
源URL[http://ir.sinano.ac.cn/handle/332007/4790]  
专题苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_刘建平团队
推荐引用方式
GB/T 7714
Liang, F.,Chen, P.,Zhao, D.G.,et al. Effects of Si-doping on field emission characteristics of AlN films grown on n-type 6H-SiC by MOCVD[J]. Materials Technology,2016.
APA Liang, F..,Chen, P..,Zhao, D.G..,Jiang, D.S..,Liu, Z.S..,...&Du, G.T..(2016).Effects of Si-doping on field emission characteristics of AlN films grown on n-type 6H-SiC by MOCVD.Materials Technology.
MLA Liang, F.,et al."Effects of Si-doping on field emission characteristics of AlN films grown on n-type 6H-SiC by MOCVD".Materials Technology (2016).
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