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	Preparation and characterization of TiB2 coatings with ultra-low low residual stress
	Chun-lei Jiang; Hai-Li Zhu; Kyunsoo Shin; Tao Wang; Guanghai Chen; Yong-bing Tang
	2016
会议名称	MSEE2016
会议地点	四川成都
英文摘要	Industrial application of TiB2 coatings have been strongly limited by the high compressive residual stress. In this work, TiB2 coatings with extremely low residual stress about 72 MPa were deposited using the DC magnetron sputtering technique on (100) silicon substrate. The significant reduction of the residual stress was achieved by balancing the tensile thermal stress and compressive intrinsic stress by adjusting the deposition temperature and substrate bias voltage. The deposition temperature was set as 500℃, and the bias voltage varied from -30 V to -200 V. TiB2 coating with the lowest residual stress was obtained at -150 V, with extremely dense microstructure and high hardness.
收录类别	EI
语种	英语
内容类型	会议论文
源URL	[http://ir.siat.ac.cn:8080/handle/172644/10162]
专题	深圳先进技术研究院_集成所
作者单位	2016
推荐引用方式 GB/T 7714	Chun-lei Jiang,Hai-Li Zhu,Kyunsoo Shin,et al. Preparation and characterization of TiB2 coatings with ultra-low low residual stress[C]. 见:MSEE2016. 四川成都.

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