High Sensitivity 17μm Pixel Pitch 640 × 512 Uncooled Infrared Focal Plane Arrays Based on Amorphous Vanadium Oxide Thin Films | |
P. Wang; S. Chen; X. Gan; R. Sun; W. Chen; S. Yang; and H. Wang | |
刊名 | IEEE ELECTRON DEVICE LETTERS |
2015 | |
英文摘要 | This letter presents a 17 µm pixel pitch 640 ×512 uncooled infrared focal plane arrays based on the double sacri- ficial layer microbolometer technology incorporating amorphous vanadium oxide thin film and frequency selective structure. The amorphous vanadium oxide thin-film features low-noise and high-thermal coefficient of resistance characteristics, which help to improve the radiometric performance of the microbolometer. By incorporating a frequency selective second platform, the responsivity of the microbolometer was improved by nearly 30% over 8∼14 µm spectra band. Noise equivalent temperature difference of less than 35 mK was obtained at 300 K ambient temperature with f/1.0 optics. |
收录类别 | SCI |
原文出处 | http://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=7145394 |
语种 | 英语 |
内容类型 | 期刊论文 |
源URL | [http://ir.siat.ac.cn:8080/handle/172644/6593] |
专题 | 深圳先进技术研究院_集成所 |
作者单位 | IEEE ELECTRON DEVICE LETTERS |
推荐引用方式 GB/T 7714 | P. Wang,S. Chen,X. Gan,et al. High Sensitivity 17μm Pixel Pitch 640 × 512 Uncooled Infrared Focal Plane Arrays Based on Amorphous Vanadium Oxide Thin Films[J]. IEEE ELECTRON DEVICE LETTERS,2015. |
APA | P. Wang.,S. Chen.,X. Gan.,R. Sun.,W. Chen.,...&and H. Wang.(2015).High Sensitivity 17μm Pixel Pitch 640 × 512 Uncooled Infrared Focal Plane Arrays Based on Amorphous Vanadium Oxide Thin Films.IEEE ELECTRON DEVICE LETTERS. |
MLA | P. Wang,et al."High Sensitivity 17μm Pixel Pitch 640 × 512 Uncooled Infrared Focal Plane Arrays Based on Amorphous Vanadium Oxide Thin Films".IEEE ELECTRON DEVICE LETTERS (2015). |
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