Toward Intrinsic Graphene Surfaces: A Systematic Study on Thermal Annealing and Wet-Chemical Treatment of SiO2-Supported Graphene Devices

	Toward Intrinsic Graphene Surfaces: A Systematic Study on Thermal Annealing and Wet-Chemical Treatment of SiO2-Supported Graphene Devices
刊名	NANO Letters
	2011
卷号	11 期号:2 页码:767-771
关键词	Graphene electrical properties thermal annealing wet-chemical treatment sensor
语种	英语
内容类型	期刊论文
源URL	[http://202.127.2.71:8080/handle/181331/10869]
专题	上海技术物理研究所_全文传递文献库_qwcd 期刊论文
推荐引用方式 GB/T 7714	. Toward Intrinsic Graphene Surfaces: A Systematic Study on Thermal Annealing and Wet-Chemical Treatment of SiO2-Supported Graphene Devices[J]. NANO Letters,2011,11(2):767-771.
APA	(2011).Toward Intrinsic Graphene Surfaces: A Systematic Study on Thermal Annealing and Wet-Chemical Treatment of SiO2-Supported Graphene Devices.NANO Letters,11(2),767-771.
MLA	"Toward Intrinsic Graphene Surfaces: A Systematic Study on Thermal Annealing and Wet-Chemical Treatment of SiO2-Supported Graphene Devices".NANO Letters 11.2(2011):767-771.