Effect of laser conditioning on the LIDT of 532nm HfO2/SiO2 reflectors

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 中科院强激光材料重点实验室

	Effect of laser conditioning on the LIDT of 532nm HfO2/SiO2 reflectors
	Liu, Jie ; Li, Xu ; Yu, Zhenkun ; Cui, Hui ; Zhang, Weili ; Zhu, Meiping ; Yi, Kui
	2013
会议名称	conference on pacific rim laser damage - optical materials for high power lasers
通讯作者	zhang, wl (reprint author), chinese acad sci, shanghai inst opt & fine mech, key lab mat high power laser, shanghai 201800, peoples r china.
英文摘要	the laser-induced damage threshold (lidt) of optical thin film is influenced by certain preconditioning processes. hfo2/sio2 532nm high reflective multi-layers were prepared by electron beam evaporation and were preconditioned by 532nm laser. the 532nm lidt, surface condition, and damage morphology of the sample were characterized and compared before and after laser conditioning process. results are presented that the lidt of e-beam deposited multilayer hfo2/sio2 thin films can be increased after laser conditioning. possible reasons for such enhancement have been analyzed.
收录类别	CPCI
会议录	pacific rim laser damage 2013: optical materials for high power lasers
会议录出版者	spie-int soc optical engineering
语种	英语
内容类型	会议论文
源URL	[http://ir.siom.ac.cn/handle/181231/17029]
专题	上海光学精密机械研究所_中科院强激光材料重点实验室
作者单位	1.[Liu, Jie 2.Li, Xu 3.Yu, Zhenkun 4.Cui, Hui 5.Zhang, Weili 6.Zhu, Meiping 7.Yi, Kui] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
推荐引用方式 GB/T 7714	Liu, Jie,Li, Xu,Yu, Zhenkun,et al. Effect of laser conditioning on the LIDT of 532nm HfO2/SiO2 reflectors[C]. 见:conference on pacific rim laser damage - optical materials for high power lasers.