Influence of oxygen pressure and substrate temperature on the properties of aluminum fluoride thin films

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 中科院强激光材料重点实验室

	Influence of oxygen pressure and substrate temperature on the properties of aluminum fluoride thin films
	Li, Xu ; Zhang, Weili ; Sun, Jian ; Liu, Jie ; Hou, Yongqiang ; Lin, Ling ; He, Kai ; Yi, Kui
刊名	appl. surf. sci.
	2013
卷号	282 页码:226
通讯作者	zhang, wl (reprint author), chinese acad sci, shanghai inst opt & fine mech, key lab mat high power laser, shanghai 201800, peoples r china.
英文摘要	single layers of alf3 were deposited at different substrate temperature by resistant heating technique in vacuum and in certain oxygen pressure. the chemical composition, total stress, optical constants and laser damage resistance were characterized. comparative study indicates that alf3 films deposited under certain oxygen pressure and lower temperature tend to absorb more water when exposed to air and as a result, their total stress and optical absorption are reduced. these differences and the increased laser-induced damage threshold (lidt) at 355 nm demonstrate that reasonable oxygen pressure and substrate temperature may improve alf3 films' uv performance. (c) 2013 elsevier b. v. all rights reserved.
收录类别	SCI
语种	英语
内容类型	期刊论文
版本	出版稿
源URL	[http://ir.siom.ac.cn/handle/181231/14852]
专题	上海光学精密机械研究所_中科院强激光材料重点实验室
作者单位	1.[Li, Xu 2.Zhang, Weili 3.Sun, Jian 4.Liu, Jie 5.Hou, Yongqiang 6.Lin, Ling 7.He, Kai 8.Yi, Kui] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China 9.[Li, Xu 10.Sun, Jian
推荐引用方式 GB/T 7714	Li, Xu,Zhang, Weili,Sun, Jian,et al. Influence of oxygen pressure and substrate temperature on the properties of aluminum fluoride thin films[J]. appl. surf. sci.,2013,282:226.
APA	Li, Xu.,Zhang, Weili.,Sun, Jian.,Liu, Jie.,Hou, Yongqiang.,...&Yi, Kui.(2013).Influence of oxygen pressure and substrate temperature on the properties of aluminum fluoride thin films.appl. surf. sci.,282,226.
MLA	Li, Xu,et al."Influence of oxygen pressure and substrate temperature on the properties of aluminum fluoride thin films".appl. surf. sci. 282(2013):226.