退火温度对宽带脉冲压缩光栅载体金属/介质多层高反膜的影响
吴建波; 晋云霞; 关贺元; 孔钒宇; 刘文文; 刘世杰; 易 葵
刊名无机材料学报
2014
卷号29期号:10页码:1087
关键词metal/dielectric multilayers pulse compression gratings annealing chemical cleaning reflectivity
其他题名Effect of Annealing Temperature on Metal/Dielectric Multilayers for Fabricating Broadband Pulse Compression Gratings
通讯作者Wu, JB (reprint author), Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China.
英文摘要Metal/dielectric multilayers were prepared by physical vapor deposition process using gold as the metal material, HfO2 and SiO2 as high and low refractive index materials, respectively. These stacks were used to fabricate broadband pulse compression gratings. Influences of annealing temperature on the surface root-mean-square roughness, reflectivity and resistance to chemical cleaning damage were investigated. The experimental results indicated that surface root-mean-square roughness of these multilayers changed only slightly after annealing Their resistance to chemical cleaning damage improved with the annealing temperature increase, whereas their reflectivity decreased. The metal/dielectric multilayers annealed at 250 degrees C for 10 h could not only endure the process of chemical cleaning, but also slightly decrease the reflectivity, suggesting that it is an optimal annealing process for metal/dielectric multilayers.
收录类别SCI
语种中文
内容类型期刊论文
版本出版稿
源URL[http://ir.siom.ac.cn/handle/181231/13740]  
专题上海光学精密机械研究所_中科院强激光材料重点实验室
作者单位1.[Wu Jian-Bo
2.Jin Yun-Xia
3.Guan He-Yuan
4.Kong Fan-Yu
5.Liu Wen-Wen
6.Liu Shi-Jie
7.Yi Kui] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
8.[Wu Jian-Bo
9.Guan He-Yuan
10.Kong Fan-Yu
推荐引用方式
GB/T 7714
吴建波,晋云霞,关贺元,等. 退火温度对宽带脉冲压缩光栅载体金属/介质多层高反膜的影响[J]. 无机材料学报,2014,29(10):1087.
APA 吴建波.,晋云霞.,关贺元.,孔钒宇.,刘文文.,...&易 葵.(2014).退火温度对宽带脉冲压缩光栅载体金属/介质多层高反膜的影响.无机材料学报,29(10),1087.
MLA 吴建波,et al."退火温度对宽带脉冲压缩光栅载体金属/介质多层高反膜的影响".无机材料学报 29.10(2014):1087.
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