High-reflectivity mirrors by Al2O3, LaF3 and AlF3 for 193 nm application

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 中科院强激光材料重点实验室

	High-reflectivity mirrors by Al2O3, LaF3 and AlF3 for 193 nm application
	Sun, Jian ; Li, Xu ; Zhang, Weili ; Yi, Kui ; Shao, Jianda
刊名	opt. laser technol.
	2014
卷号	56 页码:65
关键词	High-reflectivity Oxide Fluoride
通讯作者	zhang, wl (reprint author), chinese acad sci, shanghai inst opt & fine mech, key lab mat high power laser, shanghai 201800, peoples r china.
英文摘要	as important components in deep-ultraviolet (duv) optics, especially 193 nm lithographic systems, high-reflectivity (hr) mirrors with excellent optical properties and long lifetimes are needed urgently. in this study, we designed and produced three hr coatings for 193 nm on fused quartz substrates: al2o3/alf3 coating, laf3/alf3 coating and a double stack mirror with combined al2o3/alf3 and laf3/alf3. the reflectance of the al2o3/alf3 coating with 14 layer pairs reached 98.0% at 193 nm. however, the absorption of al2o3 prevented the reflectance to increase further. the maximum reflectance of the laf3/alf3 coating with 15 layer pairs reached 98.1%, with initial micro-cracks formation. the reflectance decreased as the number of layer pairs increased to 16 because of numerous micro-cracks. the mirror with combined al2o3/alf3 and laf3/alf3 coatings which combined their advantages obtained a reflectance of 98.8% at 193 nm after deposition. this value could still reach 98.5% at 4 months after deposition and remain stable thereafter. therefore, the combined coating of al2o3/alf3 and laf3/alf3 is an excellent candidate for practical application. (c) 2013 elsevier ltd. all rights reserved.
收录类别	SCI
语种	英语
内容类型	期刊论文
版本	出版稿
源URL	[http://ir.siom.ac.cn/handle/181231/13236]
专题	上海光学精密机械研究所_中科院强激光材料重点实验室
作者单位	1.[Sun, Jian 2.Li, Xu 3.Zhang, Weili 4.Yi, Kui 5.Shao, Jianda] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China 6.[Sun, Jian 7.Li, Xu] Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
推荐引用方式 GB/T 7714	Sun, Jian,Li, Xu,Zhang, Weili,et al. High-reflectivity mirrors by Al2O3, LaF3 and AlF3 for 193 nm application[J]. opt. laser technol.,2014,56:65.
APA	Sun, Jian,Li, Xu,Zhang, Weili,Yi, Kui,&Shao, Jianda.(2014).High-reflectivity mirrors by Al2O3, LaF3 and AlF3 for 193 nm application.opt. laser technol.,56,65.
MLA	Sun, Jian,et al."High-reflectivity mirrors by Al2O3, LaF3 and AlF3 for 193 nm application".opt. laser technol. 56(2014):65.