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题名	金属介质光栅膜的抗化学清洗工艺及机理研究
作者	张洪
学位类别	硕士
答辩日期	2016
授予单位	中国科学院上海光学精密机械研究所
导师	晋云霞
关键词	金属介质光栅膜 退火 残余应力 界面扩散 化学清洗
其他题名	Endurance study on metal multilayer dielectric during chemical cleaning
中文摘要	脉冲压缩光栅(Pulse Compressing Grating, PCG)是高功率激光系统中的重要元件，金属介质膜光栅(Metal Multilayer Dielectric Grating, MMDG)由于具有宽反射带宽、膜层数少、膜层内部应力小的特点，是脉冲压缩光栅的重要发展方向，为解决金属介质光栅膜在化学清洗时的分层及剥落问题，本文采用退火的方法，详细地探究了退火处理对金属双层膜与金属介质多层膜在应力、微结构与抗清洗性能方面的影响。 具体包括如下两个方面的工作： 1）研究了300℃下不同退火时间对金/铬双层膜的结构、形貌与应力的影响。实验结果表明：在退火过程中，铬原子将会与金以固溶体的形式从金膜下面的铬层中扩散到金膜的表面，与此同时，扩散到表面的铬原子将会被氧化，金膜表面累积的铬氧化物又会顺着金膜晶界向下扩散。本文详细讨论了在退火过程中铬原子的扩散过程与铬氧化物的逆向扩散过程对金膜应力的影响。 2）为了增强金属介质光栅膜的抗化学清洗能力，将电子束蒸发方法制备的金属介质光栅膜样品进行了不同温度的退火处理。实验结果表明高于300℃退火温度的工艺处理，样品具有很强的抗化学清洗能力，并在Au层与SiO2层的界面处观察到了过渡层的出现，从而探究了过渡层中的元素分布。机理研究表明：过渡层的形成主要是由于Cr原子从Au层的底部扩散到Au层的顶部和SiO2层的下界面形成的。该过渡层的存在增强了Au层与SiO2层的粘附力并且阻止了过氧化氢诱导的初始分层缺陷的形成，从而增强了抗化学清洗的能力。
英文摘要	Pulse compression gratings (PCG) is an important element in high power laser systems. Metal multilayer dielectric grating (MMDG) is one of the important development direction of PCG because of the wide reflection bandwidth, less number of membrances and less internal stress of membranes. In order to solve the chemical delamination problem during chemical cleaning, this article detailedly explored the effect of annealing treatment on the stress, microstructure and endurance of chemical cleaning of MMDG. Followings are the main contents of the thesis: 1) Au films with thickness of 200 nm on 10 nm Cr as adhesive layers were fabricated on the fused silica by the electron beam evaporation method. The influence of post-annealing treatment on the microstructure, surface morphology and residual stress of the Au-Cr bilayer films were studied. It was found that Cr can diffuse to the surface of the films by formatting solid solution with gold during post-annealing and Cr was oxidized on the surface and diffuses downward along the grain boundaries in gold film. The diffusion mechanisms and origin of the residual stress were analyzed and discussed. 2) The influence of annealing treatment on the interface diffusion and chemical cleaning of metals/multilayer dielectric coating was studied. The multilayer fabricated by electron beam evaporation method is composed of Cr/Au/SiO2/HfO2/SiO2/HfO2/SiO2HfO2. A thin transition layer between Au and SiO2 was observed after annealing treatment. It is shown that Cr atoms diffuse from the bottom of Au layer to the top to form a transition layer, with the higher the annealing temperature the thicker the transition layer. The transition layer enhances the adhesion between Au film and SiO2 layer and blocks the formation of the peroxide-induced delamination defects, and it was found that annealing at temperature higher than 300℃the multilayer coating demonstrates a strong resistance chemical cleaning. The diffusing channel and driving force of Cr diffusion were analyzed and discussed.
语种	中文
内容类型	学位论文
源URL	[http://ir.siom.ac.cn/handle/181231/16983]
专题	上海光学精密机械研究所_学位论文
推荐引用方式 GB/T 7714	张洪. 金属介质光栅膜的抗化学清洗工艺及机理研究[D]. 中国科学院上海光学精密机械研究所. 2016.

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