| 题名 | 高NA光刻机光瞳整形系统关键技术研究 |
| 作者 | 宋强 |
| 学位类别 | 硕士 |
| 答辩日期 | 2014 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 杨宝喜 |
| 关键词 | 光学光刻 光瞳整形 光刻仿真 衍射光学元件 轴锥镜 光学检测 |
| 其他题名 | Research on pupil shaping technique for hyper NA lithography |
| 中文摘要 | 本文针对高NA光刻机光瞳整形系统中的关键技术开展了理论研究、仿真分析、性能测试等工作。具体内容如下： 1. 论述了高数值孔径（NA）光刻机中的光瞳整形技术。研究了大规模集成电路的发展历程与光学光刻技术的发展，对高NA投影光刻机的照明系统作了综述，概述了高NA光刻机照明系统中的光瞳整形方法，即：基于衍射光学元件（DOE）的光瞳整形技术、基于自由曲面的光瞳整形技术和基于微反射镜阵列的光瞳整形技术。 2. 介绍了光瞳形状和偏振特性对光刻特征尺寸的影响，考虑到光刻特征尺寸均匀性要求，提出了一种双环径向偏振光瞳照明模式，并基于光刻仿真技术分析了双环径向偏振照明对光刻特征尺寸均匀性的影响，证明了双环径向偏振光瞳能够提高光刻特征尺寸的均匀性。 3. 介绍了投影光刻机光瞳整形用衍射光学元件的设计方法。针对目前通用DOE设计方法收敛速度慢的缺点，提出了一种混合梯度下降与噪声限制的角谱优化算法，与常规重复多分区设计相比，收敛速度明显加快，并且能够获得高信噪比的结果，经过仿真分析，该算法能够满足光瞳整形设计要求。 4. 阐述了轴锥镜的像差理论，并对轴锥镜的面形检测方法做了探讨。通过自行编写的光线追迹程序，分析了不同会聚光入射时，轴锥镜的像散变化情况，为变焦距准直镜组和变倍锥形镜组的联合优化设计提供了理论指导；编写了轴锥镜三维面形重建程序，为轴锥镜的面形检测提供了一种技术手段。将轴锥镜的面形误差导入照明分析软件中，分析了轴锥镜面形误差对光瞳整形效果的影响。 5. 构建了光瞳整形系统的光学仿真模型，分析了系统的光瞳分布。对实际研制的光瞳整形系统进行了性能测试，编写了光瞳整形系统检测软件，并对实际的光瞳整形效果进行了评估。最后总结了本论文的主要工作及成果，并指出下一步需要开展的工作。 |
| 英文摘要 | In this thesis, we focus on the key technology research and development of pupil shaping technique in illumination system of projection DUV lithography systems. The pupil shaping technique was investigated, as well as the related theoretical research, the design of the pupil shaping system, the simulation and the experiment. The specific studies can be summarized in the following aspects: 1. Briefly described the pupil shaping technique in high numerical DUV lithography system. The relationships between the development of IC and lithography systems are investigated. The projection DUV lithography system and its illumination system are clarified. Several pupil shaping techniques are introduced, i.e. the pupil shaping technique based on DOE, the pupil shaping technique based on free-form surfaces. and the pupil shaping technique based on the micro-mirror array. In this thesis, the pupil shaping technique based on DOE is chosen as the pupil shaping method. 2. The variation of critical dimensions (CD) with different pupil shape was investigated. Considering that the demand of CD’s uniformity, double annular shaped radially polarized beam was proposed for improving the uniformity of CD. It was verified based on lithography simulation. It can reduce the time cost and get a good result simultaneously. 3. The design method of DOE for pupil shaping system ware studied. Considering that the normal iterative optimization method is slowly. A mixed gradient decent and noise limited method was proposed. 4. Discussed the aberration of axicon and the method for measuring the surface of axicon. The astigmatism of axicon was investigated based on ray tracing method. It can provide a theory guide for design of pupil shaping system. Also, the three dimensional surface reconstructing program was programmed . It can provide a method for surface measuring. 5. A pupil shaping system for NA 0.75 lithography illumination system is developed. The optical performance is tested and analyzed. Procedure for online software of pupil shaping system was developed. The work, the achievements and the suggestions for the following work are summarized in the last part of the thesis. |
| 语种 | 中文 |
| 内容类型 | 学位论文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/16874]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 宋强. 高NA光刻机光瞳整形系统关键技术研究[D]. 中国科学院上海光学精密机械研究所. 2014. |
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