An approach to increase efficiency of DOE based pupil shaping technique for off-axis illumination in optical lithography

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 信息光学与光电技术实验室

	An approach to increase efficiency of DOE based pupil shaping technique for off-axis illumination in optical lithography
	Zhang, Fang ; Zhu, Jing ; Yue, Weirui ; Wang, Jian ; Song, Qiang ; Situ, Guohai ; Wyrowski, Frank ; Huang, Huijie
刊名	opt. express
	2015
卷号	23 期号:4 页码:4482
通讯作者	huang, hj (reprint author), chinese acad sci, shanghai inst opt & fine mech, shanghai 201800, peoples r china.
英文摘要	off axis illumination (oai) is one of the key resolution enhancement technologies in projection lithography system. recently, phase type diffractive optical elements (does) are adopted by most of the lithography machine manufactures to realize oai. in general, the efficiency of the oai unit is the main consideration compared with uniformity. however, the main goal of the traditional constraint of iterative fourier transformation algorithm (ifta) is used to optimize the snr, while diffraction efficiency is the secondary consideration. therefore a constraint for ifta is well designed to increase the efficiency of doe in this paper. this constraint can guarantee the pole balance at the same time. the main idea of this constraint is to apply amplitude and phase freedoms in the signal window and to control the total energy of each pole. based on the proposed constraint several does are designed for high na lithography illumination system. and remarkable improvement in the efficiency is observed compared with the traditional constraint. furthermore, the efficiency and uniformity could be weighted by adjusting the parameter with extending this constraint to general case. to demonstrate the proposed constraints, experiments are carried out where a spatial light modulator is utilized to represent does. (c) 2015 optical society of america
收录类别	SCI
语种	英语
内容类型	期刊论文
版本	出版稿
源URL	[http://ir.siom.ac.cn/handle/181231/14211]
专题	上海光学精密机械研究所_信息光学与光电技术实验室
作者单位	1.[Zhang, Fang 2.Zhu, Jing 3.Yue, Weirui 4.Wang, Jian 5.Song, Qiang 6.Situ, Guohai 7.Huang, Huijie] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China 8.[Zhang, Fang 9.Zhu, Jing 10.Yue, Weirui
推荐引用方式 GB/T 7714	Zhang, Fang,Zhu, Jing,Yue, Weirui,et al. An approach to increase efficiency of DOE based pupil shaping technique for off-axis illumination in optical lithography[J]. opt. express,2015,23(4):4482.
APA	Zhang, Fang.,Zhu, Jing.,Yue, Weirui.,Wang, Jian.,Song, Qiang.,...&Huang, Huijie.(2015).An approach to increase efficiency of DOE based pupil shaping technique for off-axis illumination in optical lithography.opt. express,23(4),4482.
MLA	Zhang, Fang,et al."An approach to increase efficiency of DOE based pupil shaping technique for off-axis illumination in optical lithography".opt. express 23.4(2015):4482.