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	Fabrication of nano-pillar with sub-100nm resolution based on thiol-ene
	Zhang, Man; Deng, Qiling; Shi, Lifang; Pang, Hui; Cao, Axiu; Hu, Song
	2014
会议名称	Proceedings of SPIE: NANOPHOTONICS AND MICRO/NANO OPTICS II
会议日期	2014
卷号	9277
页码	92771U
通讯作者	Deng, QL (reprint author), Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China.
中文摘要	This paper demonstrates an approach to fabricate nano-pillar based on thiol-ene via soft-lithography. The template is anodic aluminum oxygen (AAO) with ordered nano-holes with the diameter of 90nm. The nano-pillar consists of rigid thiol-ene features on an elastic poly(dimethylsiloxane) (PDMS) support. It is capable of patterning both flat and curved substrate. The thiol-ene is a new green UV-curable polymer material, including a number of advantages such as rapid UV-curing in the natural environment, low-cost, high resolution, and regulative performance characteristic. Here, we fabricated a two-layer structure, which included rigid thiol-ene nano-pillar with sub-100nm resolution and soft PDMS substrate. The experiment results show that this approach can be used to fabricate high-resolution features and the thiol-ene is an excellent imprint material. The fabrication technique in this paper is simple, low-cost, high-resolution and easy to high throughput, which has broad application prospects in the preparation of nanostructures.
英文摘要	This paper demonstrates an approach to fabricate nano-pillar based on thiol-ene via soft-lithography. The template is anodic aluminum oxygen (AAO) with ordered nano-holes with the diameter of 90nm. The nano-pillar consists of rigid thiol-ene features on an elastic poly(dimethylsiloxane) (PDMS) support. It is capable of patterning both flat and curved substrate. The thiol-ene is a new green UV-curable polymer material, including a number of advantages such as rapid UV-curing in the natural environment, low-cost, high resolution, and regulative performance characteristic. Here, we fabricated a two-layer structure, which included rigid thiol-ene nano-pillar with sub-100nm resolution and soft PDMS substrate. The experiment results show that this approach can be used to fabricate high-resolution features and the thiol-ene is an excellent imprint material. The fabrication technique in this paper is simple, low-cost, high-resolution and easy to high throughput, which has broad application prospects in the preparation of nanostructures.
学科主题	nano-pillar; thiol-ene; soft-lithography; PDMS
语种	英语
ISSN号	0277-786X
内容类型	会议论文
源URL	[http://ir.ioe.ac.cn/handle/181551/7664]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	1.[Zhang, Man 2.Deng, Qiling 3.Shi, Lifang 4.Pang, Hui 5.Cao, Axiu 6.Hu, Song] Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
推荐引用方式 GB/T 7714	Zhang, Man,Deng, Qiling,Shi, Lifang,et al. Fabrication of nano-pillar with sub-100nm resolution based on thiol-ene[C]. 见:Proceedings of SPIE: NANOPHOTONICS AND MICRO/NANO OPTICS II. 2014.

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