Pre-annealing induced oxide barrier to suppress the overselenization of Mo contact | |
Li W(李文)1,3; Han XX(韩修训)1,2; Zhao Y(赵雲)1; Yang SR(杨生荣)2 | |
刊名 | Journal of Materials Science: Materials in Electronics |
2016 | |
卷号 | 27期号:11页码:11188-11191 |
ISSN号 | 0957-4522 |
通讯作者 | 韩修训 ; 杨生荣 |
英文摘要 | Molybdenum (Mo) is commonly used as the back contact material complying well with the formation of an ohmic contact for chalcogenide thin film solar cells. However, the easy formation of an over-thick MoSe2 layer between the Cu2ZnSn(S,Se)4 absorber and Mo back contact significantly deteriorates the device performance. To overcome the degradation, the effects of thermal treatment on Mo layers have been investigated in this paper. It was found that pre-annealing Mo back contacts is effective to control the growth of interfacial MoSe2 layer during selenization. Moreover, the thickness of MoSe2 layer could be conveniently tailored by simply varying the pre-annealing temperature. The work provides direct proof that the appearance of a thin MoO2 layer on the top of annealed Mo film indeed acts as a temporary barrier to block the over-selenization of Mo back contact. |
学科主题 | 材料科学与物理化学 |
收录类别 | SCI |
资助信息 | the ‘‘Top Hundred Talents Program’’ of Chinese Academy of Sciences (CAS) |
语种 | 英语 |
WOS记录号 | WOS:000386367000009 |
内容类型 | 期刊论文 |
源URL | [http://210.77.64.217/handle/362003/20474] |
专题 | 兰州化学物理研究所_清洁能源化学与材料实验室 兰州化学物理研究所_固体润滑国家重点实验室 |
作者单位 | 1.Laboratory of Clean Energy Chemistry and Materials 2.State Key Laboratory of Solid Lubrication 3.University of Chinese Academy of Sciences |
推荐引用方式 GB/T 7714 | Li W,Han XX,Zhao Y,et al. Pre-annealing induced oxide barrier to suppress the overselenization of Mo contact[J]. Journal of Materials Science: Materials in Electronics,2016,27(11):11188-11191. |
APA | Li W,Han XX,Zhao Y,&Yang SR.(2016).Pre-annealing induced oxide barrier to suppress the overselenization of Mo contact.Journal of Materials Science: Materials in Electronics,27(11),11188-11191. |
MLA | Li W,et al."Pre-annealing induced oxide barrier to suppress the overselenization of Mo contact".Journal of Materials Science: Materials in Electronics 27.11(2016):11188-11191. |
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