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	Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination
	Zhao, Zeyu; Luo, Yunfei; Zhang, Wei; Wang, Changtao; Gao, Ping; Wang, Yanqin; Pu, Mingbo; Yao, Na; Zhao, Chengwei; Luo, Xiangang
刊名	SCIENTIFIC REPORTS
	2015
卷号	5页码:15320
ISSN号	2045-2322
中文摘要	For near-field imaging optics, minimum resolvable feature size is highly constrained by the near-field diffraction limit associated with the illumination light wavelength and the air distance between the imaging devices and objects. In this study, a plasmonic cavity lens composed of Ag-photoresist-Ag form incorporating high spatial frequency spectrum off-axis illumination (OAI) is proposed to realize deep subwavelength imaging far beyond the near-field diffraction limit. This approach benefits from the resonance effect of the plasmonic cavity lens and the wavevector shifting behavior via OAI, which remarkably enhances the object's subwavelength information and damps negative imaging contribution from the longitudinal electric field component in imaging region. Experimental images of well resolved 60-nm half-pitch patterns under 365-nm ultra-violet light are demonstrated at air distance of 80 nm between the mask patterns and plasmonic cavity lens, approximately four-fold longer than that in the conventional near-field lithography and superlens scheme. The ultimate air distance for the 60-nm half-pitch object could be theoretically extended to 120 nm. Moreover, two-dimensional L-shape patterns and deep subwavelength patterns are illustrated via simulations and experiments. This study promises the significant potential to make plasmonic lithography as a practical, cost-effective, simple and parallel nano-fabrication approach.
英文摘要	For near-field imaging optics, minimum resolvable feature size is highly constrained by the near-field diffraction limit associated with the illumination light wavelength and the air distance between the imaging devices and objects. In this study, a plasmonic cavity lens composed of Ag-photoresist-Ag form incorporating high spatial frequency spectrum off-axis illumination (OAI) is proposed to realize deep subwavelength imaging far beyond the near-field diffraction limit. This approach benefits from the resonance effect of the plasmonic cavity lens and the wavevector shifting behavior via OAI, which remarkably enhances the object's subwavelength information and damps negative imaging contribution from the longitudinal electric field component in imaging region. Experimental images of well resolved 60-nm half-pitch patterns under 365-nm ultra-violet light are demonstrated at air distance of 80 nm between the mask patterns and plasmonic cavity lens, approximately four-fold longer than that in the conventional near-field lithography and superlens scheme. The ultimate air distance for the 60-nm half-pitch object could be theoretically extended to 120 nm. Moreover, two-dimensional L-shape patterns and deep subwavelength patterns are illustrated via simulations and experiments. This study promises the significant potential to make plasmonic lithography as a practical, cost-effective, simple and parallel nano-fabrication approach.
学科主题	SCANNING INTERFEROMETER; THICKNESS MEASUREMENT; SILVER SUPERLENS; LITHOGRAPHY; RESOLUTION; PHOTOLITHOGRAPHY; EVANESCENT; LIGHT; FILM; NANOLITHOGRAPHY
收录类别	SCI
语种	英语
WOS记录号	WOS:000362988400001
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/6887]
专题	光电技术研究所_微细加工光学技术国家重点实验室（开放室）
推荐引用方式 GB/T 7714	Zhao, Zeyu,Luo, Yunfei,Zhang, Wei,et al. Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination[J]. SCIENTIFIC REPORTS,2015,5:15320.
APA	Zhao, Zeyu.,Luo, Yunfei.,Zhang, Wei.,Wang, Changtao.,Gao, Ping.,...&Luo, Xiangang.(2015).Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination.SCIENTIFIC REPORTS,5,15320.
MLA	Zhao, Zeyu,et al."Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination".SCIENTIFIC REPORTS 5(2015):15320.

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