Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微电子装备总体研究室（四室微光学）

	Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film
	Yukun Zhang; Xiaochun Dong; Jinglei Du; Xingzhan Wei; Lifang Shi; Qiling Deng; Chunlei Du
刊名	Optics Letters
	2010
卷号	35 期号:13 页码:2143-2145
通讯作者	Yukun Zhang
中文摘要	We propose a photolithographic method to fabricate nanostructures by employing a localized surface plasmon (LSP) mask generated by a soft mold on a thin metal film. The soft mold can be formed by transparent materials, such as polydimethylsiloxane, contacting firmly to the metal film. The pattern edges of the mold, serving as the fine tapers, can be used to excite LSPs and accumulate a large amount of localized energy from the incident light field, providing a modulated optical field in the resist with nanometer feature size. Nanolithographic results with a minimum feature size of 30 nm are demonstrated.
英文摘要	We propose a photolithographic method to fabricate nanostructures by employing a localized surface plasmon (LSP) mask generated by a soft mold on a thin metal film. The soft mold can be formed by transparent materials, such as polydimethylsiloxane, contacting firmly to the metal film. The pattern edges of the mold, serving as the fine tapers, can be used to excite LSPs and accumulate a large amount of localized energy from the incident light field, providing a modulated optical field in the resist with nanometer feature size. Nanolithographic results with a minimum feature size of 30 nm are demonstrated.
语种	英语
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/4972]
专题	光电技术研究所_微电子装备总体研究室（四室微光学）
作者单位	中国科学院光电技术研究所
推荐引用方式 GB/T 7714	Yukun Zhang,Xiaochun Dong,Jinglei Du,et al. Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film[J]. Optics Letters,2010,35(13):2143-2145.
APA	Yukun Zhang.,Xiaochun Dong.,Jinglei Du.,Xingzhan Wei.,Lifang Shi.,...&Chunlei Du.(2010).Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film.Optics Letters,35(13),2143-2145.
MLA	Yukun Zhang,et al."Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film".Optics Letters 35.13(2010):2143-2145.