Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微电子装备总体研究室（四室）

	Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene
	Zhang, Man; Cao, Axiu; Shi, Lifang; Deng, Qiling; Hu, Song
刊名	Optik
	2015
卷号	126 期号:23 页码:4123-4126
ISSN号	0030-4026
通讯作者	Hu, Song (husong@ioe.ac.cn)
中文摘要	Soft-nanoimprint lithography is a high-throughput and cost-effective lithographic technique with high resolution and low pressure, of which the crucial component is the mold. We demonstrate a method to fabricate hybrid soft-nanoimprint mold in benign ambient based on UV-curable thiol-ene polymer. Because of the special photopolymerization mechanism via "click chemistry", thiol-ene can be cured completely at ambient conditions without inhabitation from oxygen or moisture. The mold can be fabricated in air not in vacuum or a nitrogen atmosphere to simplify the fabrication process and lower the cost. Based on this method, we fabricated a soft-nanoimprint hybrid mold in benign ambient, which is composed of rigid thiol-ene features with sub-60 nm resolution on an elastic poly(dimethylsiloxane) (PDMS) substrate. © 2015 Elsevier GmbH. All rights reserved.
英文摘要	Soft-nanoimprint lithography is a high-throughput and cost-effective lithographic technique with high resolution and low pressure, of which the crucial component is the mold. We demonstrate a method to fabricate hybrid soft-nanoimprint mold in benign ambient based on UV-curable thiol-ene polymer. Because of the special photopolymerization mechanism via "click chemistry", thiol-ene can be cured completely at ambient conditions without inhabitation from oxygen or moisture. The mold can be fabricated in air not in vacuum or a nitrogen atmosphere to simplify the fabrication process and lower the cost. Based on this method, we fabricated a soft-nanoimprint hybrid mold in benign ambient, which is composed of rigid thiol-ene features with sub-60 nm resolution on an elastic poly(dimethylsiloxane) (PDMS) substrate. © 2015 Elsevier GmbH. All rights reserved.
学科主题	Cost effectiveness - Curing - Fabrication - Lithography - Microchannels - Molds - Photopolymerization - Pulse width modulation
收录类别	SCI ; EI
语种	英语
WOS记录号	WOS:000365373400125
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/7334]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
推荐引用方式 GB/T 7714	Zhang, Man,Cao, Axiu,Shi, Lifang,et al. Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene[J]. Optik,2015,126(23):4123-4126.
APA	Zhang, Man,Cao, Axiu,Shi, Lifang,Deng, Qiling,&Hu, Song.(2015).Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene.Optik,126(23),4123-4126.
MLA	Zhang, Man,et al."Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene".Optik 126.23(2015):4123-4126.