Influence of tilt moiré fringe on alignment accuracy in proximity lithography

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微电子装备总体研究室（四室）

	Influence of tilt moiré fringe on alignment accuracy in proximity lithography
	Zhu, Jiangping 1,2,3; Hu, Song 1; Yu, Junsheng 2; Tang, Yan 1; Xu, Feng ; He, Yu ; Zhou, Shaolin ; Li, Lanlan
刊名	Optics and Lasers in Engineering
	2013
卷号	51 期号:4 页码:371-381
ISSN号	01438166
通讯作者	Zhu, J. (zsyioe@163.com)
中文摘要	A moire´ fringe alignment method based on dual gratings is proposed. This method uses the phase of moire´ fringe to measure the relative linear displacement between the mask and the wafer. In practical application, the tilt moire´ fringe can occur due to the incorrect positions of the mask alignment mark and the wafer alignment mark or one of them. In this work, the presence of tilt moire´ fringe and its influence on the alignment accuracy are thoroughly analyzed. The analysis and discussions on the relationship between the revised linear displacement and the theoretical linear displacement reveal that moire´ fringes with different tilt angles have different influences on the alignment accuracy. Experimental results are given to verify that the proposed method is accurate and feasible, which can be applied to lithography and other correlated fields. © 2012 Elsevier Ltd. All rights reserved.
英文摘要	A moire´ fringe alignment method based on dual gratings is proposed. This method uses the phase of moire´ fringe to measure the relative linear displacement between the mask and the wafer. In practical application, the tilt moire´ fringe can occur due to the incorrect positions of the mask alignment mark and the wafer alignment mark or one of them. In this work, the presence of tilt moire´ fringe and its influence on the alignment accuracy are thoroughly analyzed. The analysis and discussions on the relationship between the revised linear displacement and the theoretical linear displacement reveal that moire´ fringes with different tilt angles have different influences on the alignment accuracy. Experimental results are given to verify that the proposed method is accurate and feasible, which can be applied to lithography and other correlated fields. © 2012 Elsevier Ltd. All rights reserved.
学科主题	Electrical engineering - Magnetic materials
收录类别	SCI ; EI
语种	英语
WOS记录号	WOS:000314860500006
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/7281]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	1.Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China 2.School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China 3.Graduate University of Chinese Academy of Sciences, Beijing 100039, China 4.School of Electronic and Information, South China University of Technology, Guangzhou 510640, China 5.Information Engineering College, Southwest University of Science and Technology, Mianyang 621010, China
推荐引用方式 GB/T 7714	Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Influence of tilt moiré fringe on alignment accuracy in proximity lithography[J]. Optics and Lasers in Engineering,2013,51(4):371-381.
APA	Zhu, Jiangping.,Hu, Song.,Yu, Junsheng.,Tang, Yan.,Xu, Feng.,...&Li, Lanlan.(2013).Influence of tilt moiré fringe on alignment accuracy in proximity lithography.Optics and Lasers in Engineering,51(4),371-381.
MLA	Zhu, Jiangping,et al."Influence of tilt moiré fringe on alignment accuracy in proximity lithography".Optics and Lasers in Engineering 51.4(2013):371-381.