Fabrication of nanoscale line width using the improved optical maskless lithographic system

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微电子装备总体研究室（四室）

	Fabrication of nanoscale line width using the improved optical maskless lithographic system
	Jiang Wenbo; Hu Song; Zhao Lixin; Yan WEi; Yang Yong; Zhou Shaolin; Chen Wangfu
刊名	Journal of Computational and Theoretical Nanoscience
	2009
卷号	6 期号:5 页码:1170-1174
通讯作者	Jiang Wenbo
中文摘要	In this paper, we present a novel optical maskless lithographic system. Compared with conventional optical maskless lithographic system, there are three key techniques in our system. They are illuminating system, focusing system, precise position work-stage system. We introduce and analyze three systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of optical lithographic technology with higher resolution and lower cost. By proper design the structure of the whole system and melioration on diffractive element, better resolution can be realized. It will be used to fabricate the nanoscale line width in the near future after further meliorations.
英文摘要	In this paper, we present a novel optical maskless lithographic system. Compared with conventional optical maskless lithographic system, there are three key techniques in our system. They are illuminating system, focusing system, precise position work-stage system. We introduce and analyze three systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of optical lithographic technology with higher resolution and lower cost. By proper design the structure of the whole system and melioration on diffractive element, better resolution can be realized. It will be used to fabricate the nanoscale line width in the near future after further meliorations.
收录类别	SCI ; EI
语种	英语
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/7221]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	中国科学院光电技术研究所
推荐引用方式 GB/T 7714	Jiang Wenbo,Hu Song,Zhao Lixin,et al. Fabrication of nanoscale line width using the improved optical maskless lithographic system[J]. Journal of Computational and Theoretical Nanoscience,2009,6(5):1170-1174.
APA	Jiang Wenbo.,Hu Song.,Zhao Lixin.,Yan WEi.,Yang Yong.,...&Chen Wangfu.(2009).Fabrication of nanoscale line width using the improved optical maskless lithographic system.Journal of Computational and Theoretical Nanoscience,6(5),1170-1174.
MLA	Jiang Wenbo,et al."Fabrication of nanoscale line width using the improved optical maskless lithographic system".Journal of Computational and Theoretical Nanoscience 6.5(2009):1170-1174.