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题名	光刻机投影物镜波像差在线检测关键技术研究; 光刻机投影物镜波像差在线检测关键技术研究
作者	1刘克,电工研究所
学位类别	博士
答辩日期	2008-12-24
授予单位	中国科学院电工研究所
导师	1李艳秋,电工研究所
关键词	光刻投影物镜 波像差 光学干涉测量 相移点衍射干涉仪 干涉图像处理 lithographic projection optics wavefront error optical measurement phase-shifting point diffraction interferometer interferogram analysis
其他题名	光刻机投影物镜波像差在线检测关键技术研究
中文摘要	光刻机投影物镜波像差在线检测技术是实现65nm以下技术节点光刻工艺的关键技术。本文在充分论述光刻机投影物镜波像差在线检测技术的重要性、国内外研究现状、技术要求和关键技术的基础上，针对目前为止检测精度最高的相移点衍射干涉仪（PS/PDI），重点研究了实现高精度、快速的光刻机投影物镜波像差在线检测和实时校正的四项关键技术：相移点衍射干涉测试技术、干涉图像处理技术、相移点衍射干涉仪自动对准技术和投影物镜波像差自动校正技术。 相移点衍射干涉测试技术研究方面，提出了一套完整的PS/PDI技术方案，解决了实现高精度PS/PDI的4个关键问题：系统设计、设计优化、系统误差分析和系统误差标定。干涉图像处理技术研究方面，开发了一整套适用于PS/PDI干涉图像的预处理、相位提取、相位展开和波面拟合算法，完成了PS/PDI检测Schwarzschild投影物镜波像差的干涉图像处理。PS/PDI自动对准技术方面，提出了一套适用于目前PS/PDI实验平台的自动对准技术方案，能够满足PS/PDI波像差检测和系统误差标定时高精度自动对准的要求。投影物镜波像差自动校正技术方面，建立了一套基于敏感度矩阵奇异值分解的计算机辅助装调模型，该模型能够迅速收敛，实现待测Schwarzschild投影物镜波像差的快速校正。 在PS/PDI关键技术研究的基础上，建立了一个可见光波段PS/PDI波像差在线检测实验平台，该平台已经基本实现了干涉仪的对准辅助装调、波像差检测、检测结果实时显示和波像差校正辅助装调等功能。利用PS/PDI实验平台对典型的EUV成像系统——Schwarzschild投影物镜进行波像差在线检测实验，实验结果表明：PS/PDI的X轴重复对准精度达到了0.072um, Y轴重复对准精度达到了0.066um，Z轴重复对准精度达到了0.041um；波像差重复检测精度达到了0.76mλ rms；波像差绝对检测精度达到了0.025λ rms。 In-situ wavefront error (WFE) measurement of projection optics (PO) for lithographic tool is a key technology for the realization of 65nm technology node and below. In this paper, the importance, current status, technical requirements and key techniques of in-situ WFE measurement are demonstrated in details. Then, this paper focuses on the phase-shifting point diffraction interferometer (PS/PDI), which is so far the most accurate measurement technique in at-wavelength interferometry of PO for extreme ultraviolet lithography. Four key techniques, which enable high accuracy and high speed in-situ WFE measurement of PO, are discussed: the phase-shifting point diffraction interferometry, the interferogram analysis technique of PS/PDI, the auto alignment technique of PS/PDI and the auto correction technique of WFE. In the part of phase-shifting point diffraction interferometry, a complete technical scheme of PS/PDI is proposed. Four key problems, which include the system design, design optimization, systematic error analysis and systematic error calibration of PS/PDI, are solved in this paper. In the part of interferogram analysis technique, a set of software package, which include the interferogram preprocessing, phase extraction, phase unwrapping and wavefront fitting, is developed especially for the interference pattern obtained by PS/PDI testing the WFE of Schwarzschild PO. In the part of auto alignment technique, a complete PS/PDI auto alignment technical scheme is proposed to satisfy the high accuracy alignment requirement for WFE measurement and systematic error calibration. In the part of WFE auto correction, a computer-aided alignment model based on the singular vector decomposition of sensitive matrix is proposed. Fine alignment of the Schwarzschild PO could be achieved after only one adjustment step with the aid of the model, which shows good convergence speed. An experimental visible light PS/PDI in-situ WFE measurement platform is built based on the above key techniques. The main functions of the platform include not only the measurement of WFE, but also the graphical interface of measurement result, computer-aided alignment of PS/PDI, and computer-aided correction of WFE. In the experiment part of this paper, the PS/PDI platform is used to perform in-situ WFE measurement of Schwarzschild PO, which is a typical imaging system used in extreme ultraviolet lithography. The experimental results show that, the alignment reproducibility of PS/PDI are0.072um, 0.066um and 0.041um in X, Y and Z axis, respectively; the reproducibility of WFE measurement is 0.76mλ rms and the absolute accuracy of WFE measurement is 0.025λ rms.
语种	中文
公开日期	2010-10-18
页码	146
分类号	TM1
内容类型	学位论文
源URL	[http://ir.iee.ac.cn/handle/311042/6838]
专题	电工研究所_其他部门_其他部门_博士学位论文
推荐引用方式 GB/T 7714	1刘克,电工研究所. 光刻机投影物镜波像差在线检测关键技术研究, 光刻机投影物镜波像差在线检测关键技术研究[D]. 中国科学院电工研究所. 2008.

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