Design of magnet and control of the beam emittance for Penning H- ion source

	Design of magnet and control of the beam emittance for Penning H- ion source
	欧阳华甫; Zhang HS(张华顺); Ouyang, HF; Zhang, HS
刊名	CHINESE PHYSICS C
	2008
卷号	32 期号:8 页码:668-672
关键词	H- ion source Magnetron ion source Penning ion source magnetic field gradient index
通讯作者	[Ouyang Hua-Fu ; Zhang Hua-Shun] CAS, Inst High Energy Phys, Beijing 100049, Peoples R China
英文摘要	The design requirement and principle of the deflection magnet for Magnetron and Penning H- ion source are discussed. It is proved that there exists a maximum emittance for the beam that may be transformed by the magnet into a state with equal Twiss parameters of alpha(r) = alpha(y) and beta(r) = beta(y), which is the requisite condition to get a minimum emittance at the entrance of RFQ after transporting by a LEBT with solenoids. For this maximum emittance, the corresponding magnetic field gradient index is 1.
学科主题	Physics
类目[WOS]	Physics, Nuclear ; Physics, Particles & Fields
研究领域[WOS]	Physics
原文出处	SCI
语种	英语
WOS记录号	WOS:000258423200017
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/238238]
专题	高能物理研究所_加速器中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	欧阳华甫,Zhang HS,Ouyang, HF,et al. Design of magnet and control of the beam emittance for Penning H- ion source[J]. CHINESE PHYSICS C,2008,32(8):668-672.
APA	欧阳华甫,张华顺,Ouyang, HF,&Zhang, HS.(2008).Design of magnet and control of the beam emittance for Penning H- ion source.CHINESE PHYSICS C,32(8),668-672.
MLA	欧阳华甫,et al."Design of magnet and control of the beam emittance for Penning H- ion source".CHINESE PHYSICS C 32.8(2008):668-672.