Photoluminescence study of the defects induced by neutron irradiation and rapid annealing in semi-insulating GaAs | |
Liu J(刘键); Liu, JA; Wang, PX | |
刊名 | JOURNAL OF APPLIED PHYSICS |
1999 | |
卷号 | 86期号:2页码:764-767 |
通讯作者 | Acad Sinica, Inst High Energy Phys, Beijing 100080, Peoples R China ; Univ Sci & Technol Beijing, Dept Mat Phys, Beijing 100083, Peoples R China |
英文摘要 | The rapid annealing behavior of several kinds of defects in semi-insulating GaAs irradiated with various neutron fluences has been characterized using a photoluminescence technique. In this experiment, transmutation impurities form not only donors, but also acceptors, Ge-As (the 1.4783 eV peak). The intensity ratio of the 1.4783 eV peak (Ge-As) to the 1.4917 eV peak (C-As) increases with the neutron dose. This finding is consistent with the expected increase of Ge-As produced by transmutation. We also see that short time heat treatment leads to the increase of antisite defects Ga-As and of complex centers I-Ga-V-As after neutron irradiation. Based on analysis of the rapid annealing process in comparison with the regular annealing process, it is concluded that the two kinds of defects Ga-As and I-Ga-V-As are the products of defect reactions during the annealing process. (C) 1999 American Institute of Physics. [S0021-8979(99)02614-6]. |
学科主题 | Physics |
类目[WOS] | Physics, Applied |
研究领域[WOS] | Physics |
原文出处 | SCI |
语种 | 英语 |
WOS记录号 | WOS:000081171800009 |
内容类型 | 期刊论文 |
源URL | [http://ir.ihep.ac.cn/handle/311005/238443] |
专题 | 高能物理研究所_多学科研究中心 |
作者单位 | 中国科学院高能物理研究所 |
推荐引用方式 GB/T 7714 | Liu J,Liu, JA,Wang, PX. Photoluminescence study of the defects induced by neutron irradiation and rapid annealing in semi-insulating GaAs[J]. JOURNAL OF APPLIED PHYSICS,1999,86(2):764-767. |
APA | 刘键,Liu, JA,&Wang, PX.(1999).Photoluminescence study of the defects induced by neutron irradiation and rapid annealing in semi-insulating GaAs.JOURNAL OF APPLIED PHYSICS,86(2),764-767. |
MLA | 刘键,et al."Photoluminescence study of the defects induced by neutron irradiation and rapid annealing in semi-insulating GaAs".JOURNAL OF APPLIED PHYSICS 86.2(1999):764-767. |
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